Single particle film etching mask and production method of single particle film etching mask, production method of micro structure with use of single particle film etching mask and micro structure produced by micro structure production method
A micro structure which is preferred as an original plate of an antireflection, a mold of nano imprint or injection molding is obtained by a single particle film etching mask on which each particle is precisely aligned and closest packed in two dimensions. A single particle film etching mask is produced by a drip step wherein a dispersed liquid in which particles dispersed in a solvent are dripped onto a liquid surface of a water tank, a single particle film formation step in which a single particle film which consists of the particles by volatizing a solvent is formed, and a transfer step in which the single particle film is transferred to a substrate. The single particle film etching mask on which particles are closest packed in two dimensions, has a misalignment D(%) of an array of the particles that is defined by D(%)=|B−A|×100/A being less than or equal to 10%. However, A is the average diameter of the particles, and B is the average pitch between the particles in the single particle film.
1. A method of producing a single particle film etching mask comprising:
a drip step in which a dispersed liquid in which particles dispersed in a solvent are dripped onto a liquid surface of a water tank;
a single particle film formation step in which an ultrasonic sound irradiates from a substratum water of the water tank to the liquid surface of the water tank, and a single particle film including particles obtained by volatizing the solvent is formed; and
a transcription step in which the single particle film is transcribed to a substrate,
wherein an ultrasonic frequency of the ultrasonic sound is 700 kHz to 2 MHz.
2. A method of producing a micro structure comprising:
a drip step in which a dispersed liquid in which particles dispersed in a solvent are dripped onto a liquid surface of a water tank;
a single particle film formation step in which an ultrasonic sound irradiates from a substratum water of the water tank to the liquid surface of the water tank, and a single particle film including of particles obtained by volatizing the solvent is formed;
a transcription step in which the single particle film is transcribed to a substrate; and
an etching step in which the substrate is etched with gas-phase etching using the single particle film as an etching mask,
wherein an ultrasonic frequency of the ultrasonic sound is 700 kHz to 2 MHz.