Patent Assignment
Reel/Frame 022247/0989
Assignment of Assignor's Interest
Recorded: 2009-02-12
Pages: 4
Assignors
SAITOU, MANABU
Executed: 2008-10-08
ISO, JUNICHI
Executed: 2008-10-16
ICHIKAWA, TATSUYA
Executed: 2008-10-16
OHASHI, TAKESHI
Executed: 2008-10-20
YORI, HANAKO
Executed: 2008-09-30
MIYASAKA, MASAHIRO
Executed: 2008-09-30
KUMAKI, TAKASHI
Executed: 2008-09-30
Assignee
HITACHI CHEMICAL COMPANY, LTD.
1-1, NISHI-SHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO, 163-0449, JAPAN
Covered Property
(1)
Photosensitive Element, Method for Formation of Resist Pattern, and Method for Production of Print Circuit Board
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Addess of Assignee
May 6, 2013
From: HITACHI CHEMICAL CO., LTD.
To: HITACHI CHEMICAL CO., LTD.
Reel/Frame 030359/0225 →
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →