Patent Assignment
Reel/Frame 030359/0225
Change of Addess of Assignee
Recorded: 2013-05-06
Pages: 3
Assignor
HITACHI CHEMICAL CO., LTD.
Executed: 2013-05-06
Assignee
HITACHI CHEMICAL CO., LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property
(1)
Photosensitive Element, Method for Formation of Resist Pattern, and Method for Production of Print Circuit Board
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Feb 12, 2009
From: SAITOU, MANABU; ISO, JUNICHI; ICHIKAWA, TATSUYA; OHASHI, TAKESHI
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 022247/0989 →
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →