IP Library Assignment 022609/0660
Patent Assignment
Reel/Frame 022609/0660

Assignment of Assignor's Interest

Recorded: 2009-04-29 Pages: 2
Assignors
SHISHIDO, CHIE
Executed: 2009-02-02
TANAKA, MAKI
Executed: 2009-01-30
MIYAMOTO, ATSUSHI
Executed: 2009-02-02
Assignee
HITACHI, LTD.
6-6, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Scanning Electron Microscope System and Method for Measuring Dimensions of Patterns Formed on Semiconductor Device by Using the System
Patent: 8,110,800 →
Application: 12/370,870 →
Publication: US 2009/0212212
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jul 24, 2009
From: HITACHI, LTD.
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 023002/0147 →
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →