IP Library Assignment 022700/0575
Patent Assignment
Reel/Frame 022700/0575

Assignment of Assignor's Interest

Recorded: 2009-05-19 Pages: 2
Assignors
KITADA, HIROHO
Executed: 2009-02-17
NAKAMOTO, KAZUNORI
Executed: 2009-02-17
SAKAI, YOSUKE
Executed: 2009-02-17
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma processing apparatus and operation method thereof
Patent: 8,828,257 →
Application: 12/379,641 →
Publication: US 2010/0163403
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →