IP Library Assignment 022760/0938
Patent Assignment
Reel/Frame 022760/0938

Assignment of Assignor's Interest

Recorded: 2009-06-01 Pages: 8
Assignors
EHM, DIRK HEINRICH
Executed: 2009-03-09
MUELLENDER, STEPHAN
Executed: 2009-03-12
STEIN, THOMAS
Executed: 2009-03-12
MOORS, JOHANNES HUBERTUS JOSEPHINA
Executed: 2009-03-10
WOLSCHRIJN, BASTIAAN THEODOOR
Executed: 2009-03-27
KRAUS, DIETER
Executed: 2009-04-02
VERSLUIS, RICHARD
Executed: 2009-03-26
Assignees
CARL ZEISS SMT AG
RUDOLF-EBER-STRASSE 2, OBERKOCHEN, 73447, GERMANY
ASML NETHERLANDS B.V.
DE RUN 6501, VELDHOVEN, 5504DR, NETHERLANDS
Covered Property (1)
Optical Arrangement, in Particular Projection Exposure Apparatus for Euv Lithography, as Well as Reflective Optical Element with Reduced Contamination
Patent: 8,382,301 →
Application: 12/403,233 →
Publication: US 2009/0231707
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
A Modifying Conversion Jan 18, 2011
From: CARL ZEISS SMT AG
To: CARL ZEISS SMT GMBH
Reel/Frame 025763/0367 →
Re-Record to Change Correspondence Information of Assignment Recorded at Reel/Frame 027760/0938 Apr 15, 2011
From: EHM, DIRK HEINRICH; MUELLENDER, STEPHAN; STEIN, THOMAS; MOORS, JOHANNES HUBERTUS JOSEPHINA
To: CARL ZEISS SMT GMBH; ASML NETHERLANDS B.V.
Reel/Frame 026234/0844 →