Assignment of Assignor's Interest

Recorded: 2009-08-18 Pages: 2

Assignors

YAMADA, AKIO

Executed: 2008-03-24

YABE, TAKAYUKI

Executed: 2008-03-24

TANAKA, HITOSHI

Executed: 2008-03-24

Assignee

ADVANTEST CORPORATION

32-1, ASAHICHO 1-CHOME, NERIMA-KU, TOKYO, 179-0071, JAPAN

Covered Property (1)

Mask for Multi-Column Electron Beam Exposure, and Electron Beam Exposure Apparatus and Exposure Method Using the Same

Patent: 8,196,067 →

Application: 12/583,319 →

Publication: US 2009/0311613

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.