Patent Assignment
Reel/Frame 023269/0841
Assignment of Assignor's Interest
Recorded: 2009-09-23
Pages: 3
Assignor
CHOI, JIN-WOO
Executed: 2009-09-17
Assignee
SAMSUNG ELECTRONICS CO., LTD.
416 MAETAN-DONG, YEONGTON-GU, SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF
Covered Property
(1)
Method of Silicide Formation by Adding Graded Amount of Impurity During Metal Deposition
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Sep 23, 2009
From: KWON, OH-JUNG; DOMENICUCCI, ANTHONY G.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 023269/0868 →
Assignment of Assignor's Interest
Sep 23, 2009
From: KWON, O SUNG
To: INFINEON TECHNOLOGIES NORTH AMERICA CORP.
Reel/Frame 023269/0887 →
Assignment of Assignor's Interest
Oct 20, 2009
From: INFINEON TECHNOLOGIES NORTH AMERICA CORP.
To: INFINEON TECHNOLOGIES AG
Reel/Frame 023396/0215 →