IP Library › Assignment 023269/0887
Patent Assignment
Reel/Frame 023269/0887

Assignment of Assignor's Interest

Recorded: 2009-09-23 Pages: 2
Assignor
KWON, O SUNG
Executed: 2009-08-27
Assignee
INFINEON TECHNOLOGIES NORTH AMERICA CORP.
640 NORTH MCCARTHY BOULEVARD, MILPITAS, CALIFORNIA, 95035
Covered Property (1)
Method of Silicide Formation by Adding Graded Amount of Impurity During Metal Deposition
Patent: 8,021,982 →
Application: 12/563,459 →
Publication: US 2011/0070732
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 23, 2009
From: CHOI, JIN-WOO
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 023269/0841 →
Assignment of Assignor's Interest Sep 23, 2009
From: KWON, OH-JUNG; DOMENICUCCI, ANTHONY G.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 023269/0868 →
Assignment of Assignor's Interest Oct 20, 2009
From: INFINEON TECHNOLOGIES NORTH AMERICA CORP.
To: INFINEON TECHNOLOGIES AG
Reel/Frame 023396/0215 →