IP Library Assignment 023334/0866
Patent Assignment
Reel/Frame 023334/0866

Assignment of Assignor's Interest

Recorded: 2009-10-06 Pages: 4
Assignors
NISHIMURA, YUKIO
Executed: 2009-03-10
SUGIE, NORIHIKO
Executed: 2009-03-10
NAKASHIMA, HIROMITSU
Executed: 2009-03-10
NATSUME, NORIHIRO
Executed: 2009-03-11
KOUNO, DAITA
Executed: 2009-03-17
Assignee
JSR CORPORATION
1-9-2, HIGASHI-SHINBASHI, MINATO-KU, TOKYO, 105-8640, JAPAN
Covered Property (1)
Composition for Formation of Upper Layer Film, and Method for Formation of Photoresist Pattern
Patent: 8,895,229 →
Application: 12/445,152 →
Publication: US 2010/0021852
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
Change of Name Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →