IP Library Assignment 023595/0043
Patent Assignment
Reel/Frame 023595/0043

Assignment of Assignor's Interest

Recorded: 2009-12-02 Pages: 5
Assignors
MATSUMOTO, TAICHI
Executed: 2009-09-17
UENO, TOMIKAZU
Executed: 2009-09-24
ANDOU, MICHIAKI
Executed: 2009-09-28
Assignee
JSR CORPORATION
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN
Covered Property (1)
Aqueous Dispersion for Chemical Mechanical Polishing and Chemical Mechanical Polishing Method for Semiconductor Device
Patent: 8,349,207 →
Application: 12/529,545 →
Publication: US 2010/0099260
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
Change of Name Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →