Patent Assignment
Reel/Frame 023903/0965
Assignment of Assignor's Interest
Recorded: 2010-02-05
Pages: 3
Assignors
SATAKE, MAKOTO
Executed: 2010-01-19
MAEDA, KENJI
Executed: 2010-01-22
YOKOGAWA, KENETSU
Executed: 2010-01-19
TETSUKA, TSUTOMU
Executed: 2010-01-19
USUI, TATEHITO
Executed: 2010-01-19
NISHIO, RYOJI
Executed: 2010-01-22
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU,, TOKYO, 105-8717, JAPAN
Covered Property
(1)
Plasma Etching Method and Plasma Etching Apparatus
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.