Patent Assignment
Reel/Frame 023948/0102
Assignment of Assignor's Interest
Recorded: 2010-02-17
Pages: 3
Assignors
MAN, XIN
Executed: 2010-01-26
IWASAKI, KOUJI
Executed: 2010-02-01
TASHIRO, JUNICHI
Executed: 2010-02-02
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property
(1)
Focused Ion Beam System and Sample Processing Method Using the Same
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →
Change of Address
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
Change of Name
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →