Patent Assignment
Reel/Frame 023955/0738
Assignment of Assignor's Interest
Recorded: 2010-02-18
Pages: 4
Assignors
TERASAWA, TSUNEO
Executed: 2010-02-10
TANAKA, TOSHIHIKO
Executed: 2010-02-10
AOYAMA, HAJIME
Executed: 2010-02-10
SUGA, OSAMU
Executed: 2010-02-10
SHIGEMURA, HIROYUKI
Executed: 2010-02-10
Assignees
NEC ELECTRONICS CORPORATION
1753 SHIMONUMABE, NAKAHARA-KU, KAWASAKI-SHI, KANAGAWA, 211-8668, JAPAN
FUJITSU MICROELECTRONICS LIMITED
7-1, NISHI-SHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO, 163-0722, JAPAN
Covered Property
(1)
Method of Inspecting Mask Pattern and Mask Pattern Inspection Apparatus
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Oct 26, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025194/0905 →
Change of Name
Dec 5, 2011
From: FUJITSU MICROELECTRONICS LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 027327/0143 →
Change of Address
Dec 23, 2016
From: FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 041188/0401 →
Change of Address
Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →