IP Library Assignment 023970/0979
Patent Assignment
Reel/Frame 023970/0979

Assignment of Assignor's Interest

Recorded: 2010-02-22 Pages: 3
Assignor
LEE, SANG IN
Executed: 2010-02-19
Assignee
SYNOS TECHNOLOGY, INC.
707 GAIL AVENUE, SUNNYVALE, CALIFORNIA, 94086
Covered Property (1)
Method for Forming Thin Film Using Radicals Generated by Plasma
Patent: 8,257,799 →
Application: 12/709,763 →
Publication: US 2010/0215871
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Security Agreement Mar 30, 2010
From: SYNOS TECHNOLOGY, INC.
To: NOVELLUS DEVELOPMENT COMPANY, LLC
Reel/Frame 024161/0267 →
Release of Security Interest Mar 29, 2012
From: NOVELLUS DEVELOPMENT COMPANY, LLC
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 027956/0025 →
Change of Name Nov 7, 2013
From: SYNOS TECHNOLOGY, INC.
To: VEECO ALD INC.
Reel/Frame 031599/0531 →