Patent Assignment
Reel/Frame 031599/0531
Change of Name
Recorded: 2013-11-07
Pages: 7
Assignor
SYNOS TECHNOLOGY, INC.
Executed: 2013-10-01
Assignee
VEECO ALD INC.
3191 LAURELVIEW COURT, FREMONT, CALIFORNIA, 94538
Covered Properties
(75)
Vapor Deposition Reactor
Plasma Reactor Having Injector
Application:
12/539,142 →
Publication:
US 2010/0037824
Forming Substrate Structure by Filling Recesses with Deposition Material
Vapor Deposition Reactor for Forming Thin Film
Vapor Deposition Reactor
Application:
12/539,490 →
Publication:
US 2010/0037820
Vapor Deposition Reactor Using Plasma and Method for Forming Thin Film Using the Same
Electrode for Generating Plasma and Plasma Generator
Electrode Structure, Device Comprising the Same and Method for Forming Electrode Structure
Method for Forming Thin Film Using Radicals Generated by Plasma
Vapor Deposition Reactor and Method for Forming Thin Film
Vapor Deposition Reactor for Forming Thin Film on Curved Surface
Application:
12/890,504 →
Publication:
US 2011/0076421
Vaporizing or Atomizing of Electrically Charged Droplets
Application:
13/094,637 →
Publication:
US 2011/0262650
Protective structure enclosing device on flexible substrate
Application:
13/107,750 →
Publication:
US 2011/0290551
Treating Surface of Substrate Using Inert Gas Plasma in Atomic Layer Deposition
Application:
13/185,793 →
Publication:
US 2012/0021252
Rotating Reactor Assembly for Depositing Film on Substrate
Application:
13/190,104 →
Publication:
US 2012/0027953
Deposition of Layer Using Depositing Apparatus with Reciprocating Susceptor
Formation of Barrier Layer on Device Using Atomic Layer Deposition
Radical Reactor with Multiple Plasma Chambers
Application:
13/285,417 →
Publication:
US 2012/0114877
Extended Reactor Assembly with Multiple Sections for Performing Atomic Layer Deposition on Large Substrate
Application:
13/295,012 →
Publication:
US 2012/0125258
Combined Injection Module for Sequentially Injecting Source Precursor and Reactant Precursor
Atomic Layer Deposition Using Radicals of Gas Mixture
Depositing Thin Layer of Material on Permeable Substrate
Application:
13/372,290 →
Publication:
US 2012/0213947
Enhanced Deposition of Layer on Substrate Using Radicals
Magnetic Field Assisted Deposition
Depositing Material with Antimicrobial Properties on Permeable Substrate Using Atomic Layer Deposition
Application:
13/535,155 →
Publication:
US 2013/0022658
Depositing Material on Fibrous Textiles Using Atomic Layer Deposition for Increasing Rigidity and Strength
Growing of Gallium-Nitrade Layer on Silicon Substrate
Method for Forming Thin Film Using Radicals Generated by Plasma
Forming Substrate Structure by Filling Recesses with Deposition Material
Linear Atomic Layer Deposition Apparatus
Application:
13/647,974 →
Publication:
US 2013/0092085
Securing of Shadow Mask and Substrate on Susceptor of Deposition Apparatus
Deposition of Graphene or Conjugated Carbons Using Radical Reactor
Application:
13/742,148 →
Publication:
US 2014/0030447
Plasma Reactor with Conductive Member in Reaction Chamber for Shielding Substrate from Undesirable Irradiation
Scanning Injector Assembly Module for Processing Substrate
Vapor Deposition Reactor for Forming Thin Film
Reactor in Deposition Device with Multi-Staged Purging Structure
Application:
13/904,825 →
Publication:
US 2013/0337172
Enhancing Deposition Process by Heating Precursor
Application:
13/943,523 →
Publication:
US 2014/0037846
Cooling Substrate and Atomic Layer Deposition Apparatus Using Purge Gas
Application:
13/966,103 →
Publication:
US 2014/0065307
Arc Plasma Source with Pre-Cursor Injector
Application:
61/088,670 →
ALD Injector Design
Application:
61/088,674 →
ALD Injector Design
Application:
61/088,677 →
Method of Forming Substrate Structure and Method of Manufacturing Device Comprising the Same
Application:
61/088,679 →
Electrode Structure, Device Using The Same and Method for Forming Electrode Structure
Application:
61/146,161 →
Method for Forming Thin Film
Application:
61/154,664 →
Reactor Apparatus for Atomic Layer Deposition and Method of Forming Thin Film Using the Reactor Apparatus
Application:
61/185,076 →
Depositing Thin Films on Curved or Flexible Substrate
Application:
61/247,096 →
Vaporizing by Electrically Charging Droplets
Application:
61/328,512 →
Structure with Flexible Substrate and Hemispheric Microstructures
Application:
61/348,216 →
Remote Plasma Assisted Atomic Layer Deposition
Application:
61/366,906 →
Rotating Reactor Assembly for Atomic Layer Deposition
Application:
61/368,442 →
Vapor Deposition Reactor Having Coaxial Capacitive-type Plasma Reactors And Process Using Same
Application:
61/394,275 →
Barrier Formation Method
Application:
61/405,395 →
Vapor Deposition Reactor with Separate Remote-Plasma Reactors
Application:
61/410,796 →
Long Radical-Assisted Vapor Deposition Reactor
Application:
61/416,931 →
Alternating ALD Pulsing Reactor
Application:
61/442,778 →
Radical Reactor Process
Application:
61/443,556 →
Radical-assisted molecular layer deposition
Application:
61/444,651 →
Vapor deposition reactor for depositing a thin-film on permeable substrate
Application:
61/444,658 →
Magnetic field assisted vapor deposition reactor
Application:
61/470,405 →
Fiber or Textile Coated with Material Using Atomic Layer Deposition for Increased Strength
Application:
61/511,025 →
Moving Mechanism for ALD Process Chamber
Application:
61/548,102 →
Structure of Atomic Layer Deposition (ALD) Apparatus
Application:
61/558,124 →
Securing of Shadow Mask on Susceptor for Atomic Layer Deposition
Application:
61/558,132 →
Deposition of Graphene Using Plasma Reactor
Application:
61/587,555 →
Purge Mechanism for Shuttle with Wings for Performing Atomic Layer Deposition (ALD)
Application:
61/593,747 →
Insertion Structure of Cylindrical Conductor for Preventing Plasma-Induced Damage in Plasma Reactor
Application:
61/609,836 →
Scanning Injector Module Assembly
Application:
61/617,525 →
Plasma Vapor Reactors with Various Modifications
Application:
61/643,159 →
Deposition Device with Multi-Staged Purging Structure
Application:
61/661,750 →
Enhancing Deposition Process by Heating Precursor
Application:
61/678,428 →
Cooling Substrate and Atomic Layer Deposition Apparatus Using Purge Gas
Application:
61/697,701 →
Hydrophobic and Oleophobic Encapsulation Material with Alternating Layers
Application:
61/728,648 →
Cascaded Plasma Reactor
Application:
61/755,353 →
Formation of Encaptulation Layer on Display Device Using Ozone Remote Plasma
Application:
61/815,980 →
Atomic Layer Deposition Using Precursor Injectors Movable within Chamber Filled with Precursor Material
Application:
61/835,436 →
Related Assignments
(25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Aug 5, 2008
From: OH, JAE-EUNG
To: WOOREE LST CO., LTD.
Reel/Frame 021338/0636 →
Assignment of Assignor's Interest
Oct 8, 2008
From: WOOREE LST CO., LTD
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 021647/0820 →
Assignment of Assignor's Interest
Aug 12, 2009
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 023091/0766 →
Assignment of Assignor's Interest
Aug 12, 2009
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 023091/0962 →
Assignment of Assignor's Interest
Aug 12, 2009
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 023091/0809 →
Assignment of Assignor's Interest
Aug 12, 2009
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 023096/0578 →
Assignment of Assignor's Interest
Sep 16, 2009
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 023242/0112 →
Assignment of Assignor's Interest
Sep 16, 2009
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 023242/0131 →
Assignment of Assignor's Interest
Jan 19, 2010
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 023812/0670 →
Assignment of Assignor's Interest
Feb 22, 2010
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 023970/0979 →
Security Agreement
Mar 30, 2010
From: SYNOS TECHNOLOGY, INC.
To: NOVELLUS DEVELOPMENT COMPANY, LLC
Reel/Frame 024161/0267 →
Assignment of Assignor's Interest
Jun 4, 2010
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 024489/0218 →
Security Agreement
Aug 19, 2010
From: SYNOS TECHNOLOGY, INC.
To: NOVELLUS DEVELOPMENT COMPANY, LLC
Reel/Frame 024858/0203 →
Assignment of Assignor's Interest
Sep 27, 2010
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 025047/0277 →
Assignment of Assignor's Interest
Apr 26, 2011
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 026184/0475 →
Assignment of Assignor's Interest
Jun 28, 2011
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 026517/0827 →
Security Agreement
Jul 14, 2011
From: SYNOS TECHNOLOGY, INC.
To: NOVELLUS DEVELOPMENT COMPANY, LLC
Reel/Frame 026590/0056 →
Assignment of Assignor's Interest
Aug 9, 2011
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 026723/0631 →
Assignment of Assignor's Interest
Aug 10, 2011
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 026731/0214 →
Security Agreement
Sep 22, 2011
From: SYNOS TECHNOLOGY, INC.
To: NOVELLUS DEVELOPMENT COMPANY, LLC
Reel/Frame 026953/0453 →
Security Agreement
Sep 29, 2011
From: SYNOS TECHNOLOGY, INC.
To: NOVELLUS DEVELOPMENT COMPANY, LLC
Reel/Frame 026989/0763 →
Assignment of Assignor's Interest
Nov 30, 2011
From: LEE, SANG IN; HWANG, CHANG WAN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 027302/0678 →
Assignment of Assignor's Interest
Dec 2, 2011
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 027322/0275 →
Assignment of Assignor's Interest
Dec 8, 2011
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 027348/0154 →
Assignment of Assignor's Interest
Dec 8, 2011
From: LEE, SANG IN
To: SYNOS TECHNOLOGY, INC.
Reel/Frame 027348/0160 →