IP Library › Patent Application 61185076
Patent Application Provisional Small
App. No. 61/185,076 · Confirmation No. 3388

Reactor Apparatus for Atomic Layer Deposition and Method of Forming Thin Film Using the Reactor Apparatus

Inventor: Sang In Lee
Provisional Application Expired
⬇ PDF
 Code Description Pages PDF
2010-05-26 SPEC Specification 28 View
2010-05-26 CLM Claims 4 View
2010-05-26 APPENDIX Appendix to the specification 52 View
2010-05-26 N417 Electronic Filing System Acknowledgment Receipt 2 View
2009-06-29 APP.FILE.REC Filing Receipt 3 View
2009-06-29 M327 Miscellaneous Communication to Applicant - No Action Count 1 View
2009-06-08 SPECNO Specification - Not in English 27 View
2009-06-08 ADS Application Data Sheet 4 View
2009-06-08 WFEE Fee Worksheet (SB06) 2 View
2009-06-08 N417 Electronic Filing System Acknowledgment Receipt 3 View
2009-06-08 DRW Drawings-only black and white line drawings 52 View
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Quick Facts
App. No.
61/185,076
Filed
2009-06-08