Vapor deposition reactor for forming thin film
A vapor deposition reactor includes a chamber filled with a first material, and at least one reaction module in the chamber. The reaction module may be configured to make a substrate pass the reaction module through a relative motion between the substrate and the reaction module. The reaction module may include an injection unit for injecting a second material to the substrate. A method for forming thin film includes positioning a substrate in a chamber, filling a first material in the chamber, moving the substrate relative to a reaction module in the chamber, and injecting a second material to the substrate while the substrate passes the reaction module.
1. A method for forming a thin film on a substrate, comprising:
placing the substrate in a chamber filled with a first material to adsorb the first material on the substrate;
moving the substrate relative to a reaction module in the chamber; and
injecting a second material to the substrate as the substrate passes the reaction module, the substrate deposited with a layer of material by reaction of the second material with the first material adsorbed in the substrate or substitution of a portion of the first material adsorbed in the substrate with a portion of the second material.
2. The method according to claim 1 , further comprising, prior to injecting the second material, removing a portion of an adsorption layer of the first material adsorbed on the substrate.
3. The method according to claim 2 , wherein the removing of the portion of the adsorption layer of the first material comprises:
injecting a purge gas onto the substrate; and
pumping, from the chamber, the purge gas and the portion of the adsorption layer of the first material desorbed from the substrate by the purge gas.
4. The method according to claim 3 , wherein the purge gas is selected from a group consisting of N 2 , Ar, He and a combination thereof.
5. The method according to claim 1 , further comprising removing a portion of an adsorption layer of the second material adsorbed on the substrate after injecting the second material.
6. The method according to claim 5 , wherein removing the portion of an adsorption layer of the second material comprises:
injecting a purge gas onto the substrate; and
pumping the purge gas and the portion of the adsorption layer of the second material desorbed from the substrate by the purge gas from the chamber.
7. The method according to claim 6 , wherein the purge gas is selected from a group consisting of N 2 , Ar, He and a combination thereof.
8. The method according to claim 1 , wherein moving the substrate relative to the reaction module in the chamber comprises:
loading the substrate on a support within the chamber; and
rotating the support loaded with the substrate.
9. The method according to claim 1 , further comprising controlling temperature of an interior of the chamber.
10. The method according to claim 1 , wherein injecting the second material to the substrate comprises applying plasma, ultrahigh frequency wave or ultraviolet light to the substrate.
11. The method according to claim 1 , wherein the first material is selected from a group consisting of H 2 O, H 2 O 2 , O 2 , N 2 O, O 3 , O* radical, NH 3 , NH 2 —NH 2 , N 2 , N* radical, CH 4 , C 2 H 6 , H 2 , H* radical and a combination thereof.
12. The method according to claim 1 , wherein the second material is selected from a group consisting of a group IV compound, a III-V compound, a II-VI compound, a Ni-based compound, a Co-based compound, a Cu-based compound, an Al-based compound, a Ti-based compound, a Hf-based compound, a Zr-based compound, a Ta-based compound, a Mo-based compound, a W-based compound, a Si-based compound, a Zn-based compound, and a combination thereof.