Plasma Reactor Having Injector
A plasma reactor includes a plasma generator configured to spray plasma, and an injector located adjacent to the plasma generator and configured to inject a precursor to the plasma sprayed from the plasma injector. The injector includes a platform having an opening, at least one injection hole formed in the platform to inject the precursor to the opening, and a channel formed in the platform to connect with the at least one injection hole to carry the precursor. The plasma reactor may allow supply of the plasma together with the precursor. In case corona plasma is used where a vacuum state is not needed, a wider process window may be ensured.
1 . A plasma reactor, comprising:
a plasma generator configured to generate and spray plasma; and
an injector located adjacent to the plasma generator, the injector configured to inject a precursor to the plasma sprayed from the plasma injector.
2 . The plasma reactor of claim 1 , wherein the injector comprises a platform having a first opening, at least one injection hole and a first channel formed therein, the at least one injection hole provided on the platform to inject the precursor to the opening, and the first channel connected to the at least one first injection hole to carry the precursor to the injection hole.
3 . The plasma reactor of claim 2 , wherein an injection port is formed in the platform for injecting the precursor into the channel.
4 . The plasma reactor of claim 2 , further comprising at least one second channel connected to second injection holes.
5 . The plasma reactor of claim 4 , wherein the first channel carries a first precursor, and the second channel carries a second precursor.
6 . The plasma reactor of claim 2 , wherein the platform has a polygonal or cylindrical shape.
7 . The plasma reactor of claim 2 , wherein the injector further comprises a chamber coupled to the plasma generator, the chamber enclosing the platform.
8 . The plasma reactor of claim 7 , wherein a discharge opening is formed in the chamber for discharging the plasma and the precursor.
9 . The plasma reactor of claim 1 , wherein the precursor comprises any one selected from a group consisting of silicon, silicon compound, germanium compound, aluminum compound, titanium compound, carbon compound, gallium compound, zinc compound and a combination thereof.
10 . The plasma reactor of claim 1 , wherein the plasma generator comprises:
a chamber for receiving a reaction gas;
a first electrode and a second electrode facing each other and configured to generate an electric field in the reaction gas in the chamber; and
a power supply connected to the first and second electrodes for applying voltage across the first and second electrodes.
11 . The plasma reactor of claim 10 , wherein the first electrode has a protrusion.
12 . The plasma reactor of claim 10 , wherein a hole is formed in the second electrode for discharging the plasma generated from the reaction gas.
13 . The plasma reactor of claim 10 , wherein the reaction gas comprises argon.
14 . The plasma reactor of claim 13 , wherein the reaction gas further comprises any one selected from a group consisting of hydrogen, oxygen, hydrocarbon and a combination thereof.
15 . The plasma reactor of claim 10 , wherein the reaction gas comprises any one selected from a group consisting of nitrogen, hydrogen, ammonia and a combination thereof.
16 . The plasma reactor of claim 10 , wherein the second electrode comprises a channel for injecting particles into the chamber.
17 . The plasma reactor of claim 16 , wherein the particles comprise any one selected from a group consisting of silicon, silicon compound, germanium, germanium compound, copper, indium, selenium, zinc compound aluminum compound, zirconium compound, titanium, titanium compound, tungsten, tungsten compound, molybdenum, molybdenum compound and a combination thereof