Patent Assignment
Reel/Frame 023993/0534
Assignment of Assignor's Interest
Recorded: 2010-02-25
Pages: 4
Assignors
OGAWA, TAKASHI
Executed: 2010-01-28
NISHINAKA, KENICHI
Executed: 2010-01-28
KOYAMA, YOSHIHIRO
Executed: 2010-01-28
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property
(1)
Focused Ion Beam Apparatus
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Sep 17, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033764/0615 →
Change of Address
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
Change of Name
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →