Patent Assignment
Reel/Frame 024056/0399
Assignment of Assignor's Interest
Recorded: 2010-03-10
Pages: 8
Assignors
MOMOSE, KENJI
Executed: 2010-03-03
ODAWARA, MICHIYA
Executed: 2010-03-03
MATSUZAWA, KEIICHI
Executed: 2010-03-03
OKUMURA, HAJIME
Executed: 2010-03-03
KOJIMA, KAZUTOSHI
Executed: 2010-03-03
ISHIDA, YUUKI
Executed: 2010-03-03
TSUCHIDA, HIDEKAZU
Executed: 2010-03-03
KAMATA, ISAHO
Executed: 2010-03-03
Assignees
SHOWA DENKO K.K.
13-9, SHIBADAIMON 1-CHOME, MINATO-KU, TOKYO, 105-8518, JAPAN
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
3-1, KASUMIGASEKI 1-CHOME, CHIYODA-KU, TOKYO, 100-8921, JAPAN
CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY
1-6-1, OTEMACHI, CHIYODA-KU, TOKYO, 100-8126, JAPAN
Covered Property
(1)
Epitaxial Sic Single Crystal Substrate and Method of Manufacture of Epitaxial Sic Single Crystal Substrate
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Jul 18, 2019
From: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY; CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY
To: SHOWA DENKO K.K.
Reel/Frame 049784/0229 →
Change of Name
Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →