IP Library › Assignment 024481/0619
Patent Assignment
Reel/Frame 024481/0619

Assignment of Assignor's Interest

Recorded: 2010-06-03 Pages: 6
Assignors
KAMO, TAKASHI
Executed: 2010-03-30
SUGA, OSAMU
Executed: 2010-03-25
Assignees
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU,, TOKYO,, 105-8001, JAPAN
RENESAS TECHNOLOGY CORP.
6-2, OTEMACHI 2-CHOME, CHIYODA-KU,, TOKYO,, 100-0004, JAPAN
Covered Property (1)
Reflection-Type Exposure Mask and Method of Manufacturing a Semiconductor Device
Patent: 8,173,332 →
Application: 12/749,250 →
Publication: US 2011/0020737
Related Assignments (5)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger and Change of Name May 23, 2014
From: RENESAS TECHNOLOGY CORP.; NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 032954/0181 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →
Assignment of Assignor's Interest Sep 11, 2019
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 050339/0573 →
Merger and Change of Name Sep 13, 2019
From: TOSHIBA MEMORY CORPORATION; K. K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 050494/0645 →
Change of Name and Address Apr 20, 2020
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 052436/0702 →