IP Library Assignment 050339/0573
Patent Assignment
Reel/Frame 050339/0573

Assignment of Assignor's Interest

Recorded: 2019-09-11 Pages: 4
Assignor
KABUSHIKI KAISHA TOSHIBA
Executed: 2019-08-06
Assignee
TOSHIBA MEMORY CORPORATION
1-1 SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties (19)
Three-Dimensionally Mounted Semiconductor Module and Three-Dimensionally Mounted Semiconductor System
Patent: 7,015,572 →
Application: 10/864,512 →
Publication: US 2004/0251530
Method of Generating Writing Pattern Data of Mask and Method of Writing Mask
Patent: 7,704,645 →
Application: 11/068,904 →
Publication: US 2005/0214657
Semiconductor Device with a Sige Layer Having Uniaxial Lattice Strain
Patent: 7,592,646 →
Application: 11/389,534 →
Publication: US 2006/0267046
Element Fabrication Substrate
Patent: 7,557,018 →
Application: 11/510,745 →
Publication: US 2006/0292835
Semiconductor Device and Manufacturing Method Thereof
Patent: 8,008,751 →
Application: 11/950,716 →
Publication: US 2008/0135886
Spin Mos Field Effect Transistor and Tunneling Magnetoresistive Effect Element Using Stack Having Heusler Alloy
Patent: 7,709,867 →
Application: 12/194,797 →
Publication: US 2009/0050948
Reflective-Type Mask
Patent: 7,960,076 →
Application: 12/329,126 →
Publication: US 2009/0148781
Spin Mos Field Effect Transistor and Tunneling Magnetoresistive Effect Element Using Stack Having Heusler Alloy
Patent: 7,943,974 →
Application: 12/662,100 →
Publication: US 2010/0187585
Reflection-Type Exposure Mask and Method of Manufacturing a Semiconductor Device
Patent: 8,173,332 →
Application: 12/749,250 →
Publication: US 2011/0020737
Mask Defect Measurement Method, Mask Quality Determination Method, and Manufacturing Method of Semiconductor Device
Patent: 8,384,888 →
Application: 12/750,396 →
Publication: US 2011/0043811
Semiconductor Device and Method of Manufacturing the Same
Patent: 8,492,793 →
Application: 12/888,805 →
Publication: US 2011/0210375
Reflective Exposure Mask, Method of Fabricating Reflective Exposure Mask, Method of Inspecting Reflective Exposure Mask, and Method of Cleaning Reflective Exposure Mask
Patent: 8,535,854 →
Application: 12/972,804 →
Publication: US 2011/0151358
Semiconductor Device and Manufacturing Method Thereof
Patent: 8,174,095 →
Application: 13/037,049 →
Publication: US 2011/0147805
Mask Defect Inspection Method and Defect Inspection Apparatus
Patent: 8,699,783 →
Application: 13/230,030 →
Publication: US 2012/0063667
Semiconductor Device and Method of Manufacturing the Same
Patent: 8,766,236 →
Application: 13/236,182 →
Publication: US 2012/0168830
Method of Manufacturing Semiconductor Device Having Pre-Silicide Nitrogen Implant
Patent: 8,679,961 →
Application: 13/336,307 →
Publication: US 2012/0164800
Mask Inspection Method and Mask Inspection Apparatus
Patent: 8,797,524 →
Application: 13/403,105 →
Publication: US 2012/0218543
Semiconductor Device and Method of Manufacturing the Same
Patent: 8,574,993 →
Application: 13/422,985 →
Publication: US 2012/0175705
Method of Correcting Defects in a Reflection-Type Mask and Mask-Defect Correction Apparatus
Patent: 9,164,371 →
Application: 13/423,644 →
Publication: US 2012/0307218
Related Assignments (5)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 4, 2011
From: KAMO, TAKASHI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 025899/0815 →
Merger and Change of Name May 23, 2014
From: RENESAS TECHNOLOGY CORP.; NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 032954/0181 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →
Merger and Change of Name Sep 13, 2019
From: TOSHIBA MEMORY CORPORATION; K. K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 050494/0645 →
Change of Name and Address Apr 20, 2020
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 052436/0702 →