Patent Assignment
Reel/Frame 024533/0032
Assignment of Assignor's Interest
Recorded: 2010-06-14
Pages: 6
Assignors
YAMANE, TAKESHI
Executed: 2010-03-26
TERASAWA, TSUNEO
Executed: 2010-03-26
TANAKA, TOSHIHIKO
Executed: 2010-03-26
Assignees
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, 105-8001, JAPAN
RENESAS TECHNOLOGY CORP.
6-2, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, 100-0004, JAPAN
Covered Property
(1)
Mask Defect Measurement Method, Mask Quality Determination Method, and Manufacturing Method of Semiconductor Device
Related Assignments
(5)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger and Change of Name
May 23, 2014
From: RENESAS TECHNOLOGY CORP.; NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 032954/0181 →
Change of Address
Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →
Assignment of Assignor's Interest
Sep 11, 2019
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 050339/0573 →
Merger and Change of Name
Sep 13, 2019
From: TOSHIBA MEMORY CORPORATION; K. K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 050494/0645 →
Change of Name and Address
Apr 20, 2020
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 052436/0702 →