IP Library › Assignment 024778/0007
Patent Assignment
Reel/Frame 024778/0007

Assignment of Assignor's Interest

Recorded: 2010-08-02 Pages: 4
Assignors
HORIE, TADASHI
Executed: 2010-06-15
HIRANO, AKITO
Executed: 2010-06-21
TERASAKI, TADASHI
Executed: 2010-06-14
Assignee
HITACHI KOKUSAI ELECTRIC INC.
14-1, SOTOKANDA 4-CHOME, CHIYODA-KU, TOKYO 101-8980, JAPAN
Covered Property (1)
Substrate Processing Apparatus and Manufacturing Method of Semiconductor Device Using Plasma Generation
Patent: 8,178,445 →
Application: 12/801,444 →
Publication: US 2010/0317199
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 31, 2018
From: HITACHI KOKUSAI ELECTRIC INC.
To: KOKUSAI ELECTRIC CORPORATION
Reel/Frame 048008/0206 →