IP Library Assignment 024796/0570
Patent Assignment
Reel/Frame 024796/0570

Corrective Assignment to Correct the Typographical Error in Application No. from '11/793,515' to Read --12/793,515-- Previously Recorded on Reel 024781 Frame 0403. Assignor(S) Hereby Confirms the Assignnor's Interest.

Recorded: 2010-08-05 Pages: 8
Assignors
MAZURE, CARLOS
Executed: 2010-05-25
FERRANT, RICHARD
Executed: 2010-06-03
BOURDELLE, KONSTANTIN
Executed: 2010-05-18
NGUYEN, BICH-YEN
Executed: 2010-05-19
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
PARC TECHNOLOGIQUE DES FONTAINES, F-38190 BERNIN, FRANCE
Covered Property (1)
Method for Manufacturing a Semiconductor Substrate
Patent: 9,035,474 →
Application: 12/793,515 →
Publication: US 2011/0241157
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 4, 2012
From: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
To: SOITEC
Reel/Frame 027800/0911 →