IP Library › Assignment 025186/0107
Patent Assignment
Reel/Frame 025186/0107

Assignment of Assignor's Interest

Recorded: 2010-10-25 Pages: 3
Assignors
SHIRAISHI, DAISUKE
Executed: 2010-08-30
KAGOSHIMA, AKIRA
Executed: 2010-08-30
INOUE, SATOMI
Executed: 2010-08-30
NAKAMOTO, SHIGERU
Executed: 2010-08-30
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Plasma Processing Method
Patent: 8,784,677 →
Application: 12/856,725 →
Publication: US 2012/0018094
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →