IP Library › Assignment 025367/0509
Patent Assignment
Reel/Frame 025367/0509

Assignment of Assignor's Interest

Recorded: 2010-11-16 Pages: 4
Assignors
SHAHEEN, MOHAMAD
Executed: 2010-10-19
ALLIBERT, FREDERIC
Executed: 2010-10-05
GAUDIN, GWELTAZ
Executed: 2010-10-04
LALLEMENT, FABRICE
Executed: 2010-10-05
LANDRU, DIDIER
Executed: 2010-10-07
LANDRY, KARINE
Executed: 2010-10-08
MAZURE, CARLOS
Executed: 2010-10-05
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
CHEMIN DES FRANQUES, PARC TECHNOLOGIQUE DES FONTAINES, BERNIN, F-38190, FRANCE
Covered Property (1)
Substrate Having a Charged Zone in an Insulating Buried Layer
Patent: 8,535,996 →
Application: 12/865,838 →
Publication: US 2011/0012200
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Feb 28, 2012
From: S.O.I. TEC SILICON ON INSULATOR TECHNOLOGIES; CHEMIN DES FRANQUES; PARC TECHNOLOGIES DES FONTAINES; BERNIN. FRANCE 38190
To: SOITEC
Reel/Frame 028138/0895 →