IP Library Assignment 025607/0064
Patent Assignment
Reel/Frame 025607/0064

Assignment of Assignor's Interest

Recorded: 2011-01-10 Pages: 8
Assignors
KAMEI, TAKESHI
Executed: 2011-01-04
NAKANO, MAMORU
Executed: 2011-01-06
Assignees
MITSUBISHI POLYCRYSTALLINE SILICON AMERICA CORPORATION (MIPSA)
7800 MITSUBISHI LANE, THEODORE, ALABAMA, 36582
MITSUBISHI MATERIALS CORPORATION
3-2, OTEMACHI 1-CHOME, CHIYODA-KU, TOKYO, 100-8117, JAPAN
Covered Property (1)
Apparatus and Method for Producing Polycrystalline Silicon Having a Reduced Amount of Boron Compounds by Venting the System with an Inert Gas
Patent: 8,226,920 →
Application: 12/986,392 →
Publication: US 2012/0177558
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jun 5, 2023
From: MITSUBISHI MATERIALS CORPORATION
To: HIGH-PURITY SILICON CORPORATION
Reel/Frame 063858/0867 →