Patent Assignment
Reel/Frame 063858/0867
Assignment of Assignor's Interest
Recorded: 2023-06-05
Pages: 6
Assignor
MITSUBISHI MATERIALS CORPORATION
Executed: 2023-04-27
Assignee
HIGH-PURITY SILICON CORPORATION
5, MITA-CHO, YOKKAICHI-SHI, MIE, JAPAN
Covered Properties
(65)
Controlled Hydrolysis of Hazardous Silicon Polymer Residue
Iron Catalyzed Hydrochlorination of Silicon Tetrachloride to Trichlorosilane
Silicon Cleaning Method for Semiconductor Materials and Polycrystalline Silicon Chunk
Apparatus for Manufacturing Seeds for Polycrystalline Silicon Manufacture
Apparatus for Producing Trichlorosilane
Apparatus for Producing Trichlorosilane
Apparatus for Producing Trichlorosilane
Method for Producing Polycrystalline Silicon, and Facility for Producing Polycrystalline Silicon
Hammer for Breaking Polycrystalline Silicon
Method of packing silicon and packing body
Clean Bench and Method of Producing Raw Material for Single Crystal Silicon
Reactor for Polycrystalline Silicon and Polycrystalline Silicon Production Method
Polycrystalline Silicon Manufacturing Apparatus and Manufacturing Method
Method for Manufacturing Polycrystalline Silicon
Method for Separating and Recovering Conversion Reaction Gas
Apparatus for Producing Trichlorosilane
Reaction Apparatus for Producing Trichlorosilane and Method for Producing Trichlorosilane
Hydrogen Chloride Gas Ejecting Nozzle, Reaction Apparatus for Producing Trichlorosilane and Method for Producing Trichlorosilane
Apparatus for Producing Single Crystal Silicon
Reactor Cleaning Apparatus
Method and apparatus for manufacturing trichlorosilane
Polycrystalline Silicon Reactor
Chlorosilanes Purifying Apparatus and Chlorosilanes Manufacturing Method
Polycrystalline Silicon Manufacturing Apparatus
Polymer Inactivation Method for Polycrystalline Silicon Manufacturing Device
Apparatus for Producing Trichlorosilane
Apparatus for Producing Trichlorosilane
Apparatus for Producing Polycrystalline Silicon
Apparatus for Producing Trichlorosilane and Method for Producing Trichlorosilane
Storage Container for Liquid Chlorosilane and Closing Lid Therefor
Method of Refining Carbon Parts for Production of Polycrystalline Silicon
Apparatus and Method for Washing Polycrystalline Silicon
Method for Producing Trichlorosilane
Apparatus for Producing Trichlorosilane and Method for Producing Trichlorosilane
Polycrystalline Silicon Producing Method
Method of generating cracks in polycrystalline silicon rod and crack generating apparatus
Apparatus and method for washing polycrystalline silicon
Method of Washing Polycrystalline Silicon, Apparatus for Washing Polycrystalline Silicon, and Method of Producing Polycrystalline Silicon
Clean Bench and Method of Producing Raw Material for Single Crystal Silicon
Reactor cleaning apparatus
Apparatus for Producing Trichlorosilane and Method for Producing Trichlorosilane
Apparatus for Producing Trichlorosilane and Method for Producing Trichlorosilane
Method for Manufacturing Trichlorosilane
Reactor for Polycrystalline Silicon and Polycrystalline Silicon Production Method
Reaction Apparatus for Producing Trichlorosilane and Method for Producing Trichlorosilane
Silicon Seed Rod Assembly of Polycrystalline Silicon, Method of Forming the Same, Polycrystalline Silicon Producing Apparatus, and Method of Producing Polycrystalline Silicon
Hydrogen Chloroide Gas Ejecting Nozzle, Reaction Apparatus for Producing Trichlorosilane and Method for Producing Trichlorosilane
Method of Generating Cracks in Polycrystalline Silicon Rod and Crack Generating Apparatus
Method for Producing Trichlorosilane
Analysis Apparatus and Analysis Method of Chlorosilanes
Polycrystalline Silicon Rod
Polycrystalline Silicon Rod and Method for Producing Same
Apparatus and Method for Producing Polycrystalline Silicon Having a Reduced Amount of Boron Compounds by Forming Phosphorus-Boron Compounds
Apparatus and Method for Producing Polycrystalline Silicon Having a Reduced Amount of Boron Compounds by Venting the System with an Inert Gas
Apparatus and Method for Producing Polycrystalline Silicon Having a Reduced Amount of Boron Compounds by Venting the System with an Inert Gas
Apparatus and Method for Producing Purified Hydrogen Gas by a Pressure Swing Adsorption Processes
Apparatus and Method for Producing Purified Hydrogen Gas by a Pressure Swing Adsorption Processes
Fluidized Bed Reactor Heater
Mechanical Seed Coupling
Mechanical Seed Coupling
Fz Seed Holder and Pre-Heater
Primary Distillation Boron Reduction
Bubble Size Minimizing Internals for Fluidized Bed Reactors
Controlled Silicon Polymer Treatment Method
Method to Prevent Grounding from a Silicon Rod to a Plate in Polycrystalline Silicon Reactor
Related Assignments
(19)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Aug 26, 2004
From: OHTA, HIROTAKE
To: MITSUBISHI MATERIALS CORPORATION; MITSUBISHI POLYCRYSTALLINE SILICON AMERICA CORPORATION
Reel/Frame 015745/0568 →
Assignment of Assignor's Interest
Aug 25, 2008
From: SASAKI, GO
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021482/0355 →
Assignment of Assignor's Interest
Aug 25, 2008
From: ATSUMI, TETSUYA; TAKASUGI, MUNEHIRO
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021483/0005 →
Assignment of Assignor's Interest
Sep 19, 2008
From: ENDOH, TOSHIHIDE; ISHII, TOSHIYUKI; HATAKEYAMA, NAOKI; SAKAGUCHI, MASAAKI
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021645/0514 →
Assignment of Assignor's Interest
Oct 10, 2008
From: ISHII, TOSHIYUKI; ITO, HIDEO; SHIMIZU, YUJI
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021694/0661 →
Assignment of Assignor's Interest
Oct 10, 2008
From: ISHII, TOSHIYUKI; ITO, HIDEO; SHIMIZU, YUJI
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021694/0631 →
Assignment of Assignor's Interest
Oct 10, 2008
From: ISHII, TOSHIYUKI; ITO, HIDEO; SHIMIZU, YUJI
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021694/0640 →
Assignment of Assignor's Interest
Oct 17, 2008
From: INABA, CHIKARA
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021762/0710 →
Assignment of Assignor's Interest
Nov 14, 2008
From: GURLEY, LARRY; ROWELL, KEN; IMAMURA, SATOSHI; YAMAGUCHI, YUKIO
To: MITSUBISHI POLYCRYSTALLINE SILICON AMERICA CORPORATION; MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021835/0560 →
Assignment of Assignor's Interest
Nov 21, 2008
From: ENDOH, TOSHIHIDE; TEBAKARI, MASAYUKI; ISHII, TOSHIYUKI; SAKAGUCHI, MASAAKI
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021918/0847 →
Assignment of Assignor's Interest
Nov 26, 2008
From: ENDOH, TOSHIHIDE; TEBAKARI, MASAYUKI; ISHII, TOSHIYUKI; SAKAGUCHI, MASAAKI
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021947/0936 →
Assignment of Assignor's Interest
Nov 26, 2008
From: MASUDA, NOBUHISA; TACHINO, NOBORU
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021935/0220 →
Assignment of Assignor's Interest
Dec 1, 2008
From: SAKAI, KAZUHIRO; MIYATA, YUKIYASU
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021904/0436 →
Assignment of Assignor's Interest
Dec 12, 2008
From: TEBAKARI, MASAYUKI
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 022007/0549 →
Assignment of Assignor's Interest
Jan 16, 2009
From: INABA, CHIKARA
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 022120/0303 →
Assignment of Assignor's Interest
Oct 7, 2020
From: TEICHMILLER, WES; NETTLES, BRYAN H.; SERVOS, MARK; COLOMB, MATTHIAS A.
To: MITSUBISHI POLYCRYSTALLINE SILICON AMERICA CORPORATION (MIPSA)
Reel/Frame 053999/0101 →
Assignor's Interest in Part
Feb 4, 2021
From: MITSUBISHI POLYCRYSTALLINE SILICON AMERICA CORPORATION (MIPSA)
To: MITSUBISHI POLYCRYSTALLINE SILICON AMERICA CORPORATION (MIPSA); MITSUBISHI MATERIALS CORPORATION
Reel/Frame 055221/0914 →
Assignment of Assignor's Interest
Mar 23, 2021
From: COLOMB, MATTHIAS A.; NETTLES, BRYAN H.
To: MITSUBISHI POLYCRYSTALLINE SILICON AMERICA CORPORATION (MIPSA)
Reel/Frame 055688/0380 →
Assignment of Assignor's Interest
Oct 6, 2021
From: MITSUBISHI POLYCRYSTALLINE SILICON AMERICA CORPORATION (MIPSA)
To: MITSUBISHI POLYCRYSTALLINE SILICON AMERICA CORPORATION (MIPSA); MITSUBISHI MATERIALS CORPORATION
Reel/Frame 057715/0688 →