Apparatus for producing polycrystalline silicon
An apparatus for producing polycrystalline silicon which heats a silicon seed rod in a reactor to which a raw material gas is supplied, and deposits polycrystalline silicon on the surface of the silicon seed rod, includes an electrode extending in a vertical direction to hold the silicon seed rod, an electrode holder having a cooling flow passage circulating a cooling medium formed therein, and inserted into a through-hole formed in a bottom plate of the reactor to hold the electrode, and an annular insulating material arranged between an inner peripheral surface of the through-hole and an outer peripheral surface of the electrode holder to electrically insulate the bottom plate and the electrode holder from each other.
1. An apparatus for producing polycrystalline silicon which heats a silicon seed rod in a reactor to which a raw material gas is supplied, and deposits polycrystalline silicon on the surface of the silicon seed rod, the apparatus comprising:
an electrode extending in a vertical direction to hold the silicon seed rod;
an electrode holder having a cooling flow passage circulating a cooling medium formed therein, and inserted into a through-hole formed in a bottom plate of the reactor to hold the electrode; and
an annular insulating material arranged between an inner peripheral surface of the through-hole and an outer peripheral surface of the electrode holder to electrically insulate the bottom plate and the electrode holder from each other,
wherein an outer peripheral surface of the electrode holder is provided with an enlarged diameter portion which contacts at least a portion of a top face of an upper end of the annular insulating material and has a portion of the cooling flow passage formed therein,
the through-hole includes a lower straight portion and an upper tapered portion whose diameter gradually increases upward,
an opening of an upper end of the tapered portion is formed with a counterbore whose diameter increases more than a maximum diameter of the tapered portion, and
the enlarged diameter portion is disposed in the counterbore without contacting a side face of the counterbore.
2. The apparatus for producing polycrystalline silicon according to claim 1 ,
wherein the enlarged diameter portion covers the whole top face of the upper end of the annular insulating material.
3. The apparatus for producing polycrystalline silicon according to claim 1 ,
wherein the cooling medium cools the enlarged diameter portion, and cools the vicinity of the electrode.
4. The apparatus for producing polycrystalline silicon according to claim 1 ,
wherein the cooling flow passage has an outer peripheral flow passage through which the cooling medium is circulated at an outer peripheral portion in the electrode holder toward the upper end thereof along the longitudinal direction of the electrode holder, and an inner peripheral flow passage through which the cooling medium is circulated inside the outer peripheral flow passage toward the lower end of the electrode holder along the longitudinal direction, and a portion of the outer peripheral flow passage is formed in the enlarged diameter portion.
5. The apparatus for producing polycrystalline silicon according to claim 1 ,
wherein the annular insulating material is made of resin having elasticity.
6. The apparatus for producing polycrystalline silicon according to claim 1 , wherein the electrode holder is formed in a hollow shape.
7. The apparatus for producing polycrystalline silicon according to claim 1 , wherein the electrode holder is formed by integrating a straight rod portion, a hollow disc-like enlarged diameter portion, and a male thread portion.
8. The apparatus for producing polycrystalline silicon according to claim 1 , wherein the enlarged diameter portion has a diameter larger than that of a rod portion of the electrode holder.
9. The apparatus for producing polycrystalline silicon according to claim 1 , wherein a male thread portion of the electrode holder further protrudes upward from the top face of the enlarged diameter portion.
10. The apparatus for producing polycrystalline silicon according to claim 1 , wherein the annular insulating material comprises a sleeve and a cone member.
11. The apparatus for producing polycrystalline silicon according to claim 1 , wherein the cooling flow passage is arranged concentrically in the electrode holder.
12. The apparatus for producing polycrystalline silicon according to claim 1 , wherein the annular insulating material includes a sleeve to be inserted into the straight portion and cone member arranged at the tapered portion,
an upper end of the cone member protrude upward from the upper end of the tapered portion, and
the upper end of the cone member is made to face the counterbore.
13. The apparatus for producing polycrystalline silicon according to claim 12 , wherein the cone member is set to have a larger external diameter than the maximum external diameter of the tapered portion at the upper end thereof, so as to protrude from a bottom face of the counterbore and so as not to protrude upward from an upper end of the counterbore.
14. The apparatus for producing polycrystalline silicon according to claim 1 , wherein the enlarged diameter portion has a hollow disc-like shape.
15. The apparatus for producing polycrystalline silicon according to claim 1 , wherein the electrode holder has a configuration that
a rod-shaped rod portion and an arm portion orthogonal to an upper end of the rod portion are integrally formed,
the electrodes are respectively provided at both end of the arm portion, and
the enlarged diameter portion is attached to a longitudinal midway position of the rod-shaped rod portion.