IP Library Granted Patent US 8,945,474
Granted Patent B2
US 8,945,474 · App. 13/841,814 · Granted Feb 3, 2015

Fluidized bed reactor heater

Inventors: Matthias Colomb (Theodore, AL); Rick Deckbar (Theodore, AL); Wesley Teichmiller (Theodore, AL); Bryan Nettles (Theodore, AL)
Assignees: Mitsubishi Polycrystaline Silicon America Corporation (MIPSA); Mitsubishi Materials Corporation
B01J8/1836
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Quick Facts
Patent No.
US 8,945,474
App. No.
13/841,814
Granted
Feb 3, 2015
Kind
B2
Abstract

This invention is a heater used to heat the feed process gas from 450° C. to greater than about 600° C. for the fluidized bed reactor (FBR) used for conversion of silicon tetrachloride (STC) to trichlorosilane (TCS). The invention involves stacked heater element carbon plates. The design of the plates allow the plates to act as baffles which improve heat transfer to the feed gas. Also, the heat gradients across each plate is calculated to be approximately 100° C. which is much lower than the gradient seen by conventional vertical heater elements. The design of the present invention prevents electrical grounding. In the design, the elements are surrounded by graphite wrapped in carbon felt to prevent heat loss by radiation and conduction.

Claims (40)

1. An apparatus for producing trichlorosilane comprising:

a reactor;

a raw material supply device that supplies metallurgical grade silicon powder as raw material to the reactor;

a gas introduction device that introduces a feed gas, comprising at least a hydrogen gas and STC, to the reactor so that the hydrogen gas and STC reacts with the metallurgical grade silicon powder while the metallurgical grade silicon powder is fluidized by the hydrogen gas and STC;

a heater of stacked heater element carbon plates for heating the feed gas before contact with the metallurgical grade silicon power; and

a gas discharge device that discharges generated gas containing trichlorosilane from the reactor,

wherein the heater element stacked carbon plates are surrounded by graphite wrapped in carbon felt to prevent heat loss by radiation and conduction.

2. The apparatus of claim 1 , wherein the heater element stacked carbon plates act as baffles for the feed gas.

3. The apparatus of claim 1 , where the gradient across each heater element stacked carbon plate is approximately 100° C.

4. The apparatus of claim 1 , wherein electric current is supplied to the carbon plates by a supply electrode.

5. The apparatus of claim 4 , wherein the electrodes are surrounded by quartz to prevent grounding with surrounding insulation.

6. The apparatus of claim 1 , wherein top two baffles, above the heater element stack, ensure complete mixing of a heated gas before the heated gas passes into the distributor section.

7. The apparatus of claim 1 , wherein a greatest temperature predicted is 890° C. for heater element carbon plate number 22 .

8. The apparatus of claim 1 , wherein the heater element carbon plates are chamfered.

9. The apparatus of claim 1 , wherein the heater element carbon plates are arranged in a repeating pattern of A to B to upside-down A to upside-down B.

10. An apparatus for producing trichlorosilane comprising:

a reactor;

a raw material supply device that supplies metallurgical grade silicon powder as raw material to the reactor;

a gas introduction device that introduces a feed gas, comprising at least a hydrogen gas and STC, to the reactor so that the hydrogen gas and STC reacts with the metallurgical grade silicon powder while the metallurgical grade silicon powder is fluidized by the hydrogen gas and STC;

a heater of stacked heater element carbon plates for heating the feed gas before contact with the metallurgical grade silicon power; and

a gas discharge device that discharges generated gas containing trichlorosilane from the reactor,

wherein each heater element stacked carbon plate has an alignment hole on each opposing side of the carbon plate for accepting a ceramic sleeve extending through each alignment hole.

11. The apparatus of claim 10 , wherein a carbon rod extends through all ceramic sleeves on each opposing side of each carbon plate.

12. The apparatus of claim 10 , wherein between each alignment hole a heater element of each carbon plate is shaped in a serpentine shape.

13. The apparatus of claim 11 , wherein every subsequent carbon plate transfers electric current to the next carbon plate by a carbon spacer and when the electric current has reached the top most carbon plate, the electric current is passed to a return electrode though one of the carbon rods.

14. The apparatus of claim 11 , wherein both carbon rods are threaded at both ends so that a nut may be used to compress the entire stack and ensure good electrical conductance.

15. An apparatus for producing trichlorosilane comprising:

a reactor;

a raw material supply device that supplies metallurgical grade silicon powder as raw material to the reactor;

a gas introduction device that introduces a feed gas, comprising at least a hydrogen gas and STC, to the reactor so that the hydrogen gas and STC reacts with the metallurgical grade silicon powder while the metallurgical grade silicon powder is fluidized by the hydrogen gas and STC;

a heater of stacked heater element carbon plates for heating the feed gas before contact with the metallurgical grade silicon power; and

a gas discharge device that discharges generated gas containing trichlorosilane from the reactor,

wherein the heater element stack is surrounded by graphite.

16. An apparatus for producing trichlorosilane comprising:

a reactor;

a raw material supply device that supplies metallurgical grade silicon powder as raw material to the reactor;

a gas introduction device that introduces a feed gas, comprising at least a hydrogen gas and STC, to the reactor so that the hydrogen gas and STC reacts with the metallurgical grade silicon powder while the metallurgical grade silicon powder is fluidized by the hydrogen gas and STC;

a heater of stacked heater element carbon plates for heating the feed gas before contact with the metallurgical grade silicon power; and

a gas discharge device that discharges generated gas containing trichlorosilane from the reactor,

wherein carbon felt is wrapped around graphite parts.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2023
From: MITSUBISHI MATERIALS CORPORATION
To: HIGH-PURITY SILICON CORPORATION
Reel/Frame 063858/0867 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 22, 2014
From: COLOMB, MATTHIAS; DECKBAR, RICK; TEICHMILLER, WESLEY; NETTLES, BRYAN
To: MITSUBISHI POLYCRYSTALLINE SILICON AMERICA CORPORATION (MIPSA); MITSUBISHI MATERIALS CORPORATION
Reel/Frame 034567/0758 →
Continuity (1)
Related Publication 20140271380A1 · Sep 18, 2014