IP Library Granted Patent US 8,034,300
Granted Patent B2
US 8,034,300 · App. 12/312,367 · Granted Oct 11, 2011

Apparatus for producing trichlorosilane

Assignee: Mitsubishi Materials Corporation
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Quick Facts
Patent No.
US 8,034,300
App. No.
12/312,367
Granted
Oct 11, 2011
Kind
B2
Abstract

This apparatus for producing trichlorosilane includes: a vessel having a gas inlet that introduces a feed gas into the vessel and a gas outlet that discharges a reaction product gas to the outside; a plurality of silicon core rods provided inside the vessel; and a heating mechanism that heats the silicon core rods, wherein a feed gas containing silicon tetrachloride and hydrogen is reacted to produce a reaction product gas containing trichlorosilane and hydrogen chloride. The silicon core rods may be disposed so as to stand upright on the bottom of the vessel, and the heating mechanism may have electrode portions that hold the lower end portions of the silicon core rods on the bottom of the vessel and a power supply that applies an electric current to the silicon core rods through the electrode portions to heat the silicon core rods.

Claims (19)

1. An apparatus for producing trichlorosilane, comprising:

a vessel having a plurality of gas inlets that introduce a feed gas into the vessel and a plurality of gas outlets that discharge a reaction product gas to the outside;

a plurality of silicon core rods provided inside the vessel; and

a heating mechanism that heats the silicon core rods,

wherein the vessel has a bottom which is provided with the gas inlets and the gas outlets, and a bell jar portion which covers the bottom,

the gas outlets are disposed at regular intervals in a circumferential direction in a vicinity of a peripheral edge portion of the bottom,

the gas inlets are disposed on a side inner than positions where the gas outlets are disposed, and

a feed gas containing silicon tetrachloride and hydrogen is reacted to produce a reaction product gas containing trichlorosilane and hydrogen chloride.

2. The apparatus for producing trichlorosilane according to claim 1 ,

wherein the silicon core rods are disposed so as to stand upright on the bottom of the vessel, and

the heating mechanism has electrode portions that hold the lower end portions of the silicon core rods on the bottom of the vessel and a power supply that applies an electric current to the silicon core rods through the electrode portions to heat the silicon core rods.

3. The apparatus for producing trichlorosilane according to claim 1 ,

wherein the apparatus further comprises:

a heat insulating material provided on an inner wall of the vessel; and

a heat-insulating-material protecting material provided on an inner surface of the heat insulating material and including carbon and silicon carbide which is coated on the surface of the carbon.

4. The apparatus for producing trichlorosilane according to claim 2 ,

wherein the apparatus further comprises:

a heat insulating material provided on an inner wall of the vessel; and

a heat-insulating-material protecting material provided on an inner surface of the heat insulating material and including carbon and silicon carbide which is coated on the surface of the carbon.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2023
From: MITSUBISHI MATERIALS CORPORATION
To: HIGH-PURITY SILICON CORPORATION
Reel/Frame 063858/0867 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 7, 2009
From: ISHII, TOSHIYUKI
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 022676/0204 →
Priority Claims (2)
JP 2006-322628 · Nov 29, 2006 · national
JP 2007-276843 · Oct 24, 2007 · national
Continuity (1)
Related Publication 20100055007A1 · Mar 4, 2010