Hydrogen chloride gas ejecting nozzle, reaction apparatus for producing trichlorosilane and method for producing trichlorosilane

1. A reaction apparatus for producing trichlorosilane in which metal silicon powder is reacted with hydrogen chloride gas to generate trichlorosilane, comprising:

an apparatus main body to which the metal silicon powder is supplied;

a bottom plate portion, which is provided on a lower end of the apparatus main body and divides an internal space of the apparatus main body into an upper space, which is above the bottom plate portion, and a gas chamber, which is below the bottom plate portion and to which hydrogen chloride gas is supplied; and

a gas introduction device that introduces the hydrogen chloride gas into the apparatus main body through the bottom plate portion,

wherein the bottom plate portion has attachment holes penetrating the bottom plate portion;

the gas introduction device comprises a plurality of the hydrogen chloride gas ejecting nozzles extending above and below the bottom plate portion with a majority of a length of which being below the bottom plate portion located in the gas chamber and each nozzle having a shaft portion detachably penetrating through the attachment holes of the bottom plate portion and fixed by a nut on the shaft portion provided under the bottom plate portion, and a head portion above the bottom plate portion is arranged on the bottom plate portion while being supported by the upper surface of the bottom plate portion; and

each hydrogen chloride gas ejecting nozzle comprises:

the shaft portion, which extends in a longitudinal direction and has a supply hole connecting two distal ends thereof;

the head portion which is connected to one of the distal ends of the shaft portion and extends in a direction orthogonal to the longitudinal direction of the shaft portion; and

an equalizing pipe which is communicatively connected to the supply hole of the shaft portion;

wherein the head portion comprises:

an outer side surface which is parallel to the longitudinal direction of the shaft portion, and

a bottom plane which is perpendicular to the longitudinal direction of the shaft portion and connected to the distal end of the shaft portion,

wherein the equalizing pipe comprises:

an internal hole extending in a longitudinal direction of the equalizing pipe;

a first opening connected with the supply hole of the shaft portion; and

a second opening located proximate a vertical center of the gas chamber,

wherein a plurality of ejection holes are formed in the head portion, and

each of the ejection holes is communicatively connected to the supply hole and has an opening in the outer side surface of the head portion.

2. The reaction apparatus for producing trichlorosilane according to claim 1 , wherein a thread portion is formed on the shaft portion of each hydrogen chloride gas ejecting nozzle.

3. The reaction apparatus for producing trichlorosilane according to claim 1 , wherein the plurality of the ejection holes are formed so as to extend radially from the supply hole of the hydrogen chloride gas ejecting nozzle.

4. The reaction apparatus for producing trichlorosilane according to claim 1 , wherein the outer side surface of the head portion of the hydrogen chloride gas ejecting nozzle comprises at least a pair of planes that are parallel to each other, and each of the pair of the planes is parallel to the longitudinal direction of the shaft portion for engaging with an industrial tool.

5. A method for producing trichlorosilane by reacting hydrogen chloride gas with metal silicon powder in the reaction apparatus of claim 1 , comprising: attaching the hydrogen chloride gas ejecting nozzles to the bottom plate portion of the apparatus main body to which the silicon powder is supplied, while arranging the head portion on the bottom plate portion; supplying metal silicon powder to a lower part of the apparatus main body; and ejecting hydrogen chloride gas from the ejection holes of the hydrogen chloride gas ejecting nozzles.