IP Library Granted Patent US 8,158,072
Granted Patent B2
US 8,158,072 · App. 12/462,945 · Granted Apr 17, 2012

Analysis apparatus and analysis method of chlorosilanes

Assignee: Mitsubishi Materials Corporation
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Quick Facts
Patent No.
US 8,158,072
App. No.
12/462,945
Granted
Apr 17, 2012
Kind
B2
Abstract

The problem to be solved is to provide an analysis apparatus and analysis method of chlorosilanes capable of stably carrying out an analysis with less contamination. An analysis apparatus of chlorosilanes includes a vaporizer 10 for vaporizing chlorosilanes L and an analyzer for analyzing materials r 1 and r 2 remained by vaporizing. In the analysis apparatus, the vaporizer 10 includes a hotplate 11 , a cover 12 detachably attached onto the hotplate 11 and configuring a heating chamber 13 with the hotplate 11 , and a sample vessel 14 arranged in the heating chamber 13 and having an opening upside capable of storing the chlorosilanes L. The cover 12 includes a supply port 12 a for supplying an inert gas or nitrogen gas into the heating chamber 13 and a discharge port 12 b for discharging gases in the heating chamber 13.

Claims (29)

1. An analysis apparatus of chlorosilanes, which is in communication with an atmosphere external to the analysis apparatus, comprising:

a draft chamber having a top, a bottom, and walls which communicates with the atmosphere external to the analysis apparatus;

a vaporizer contained in the draft chamber for vaporizing chlorosilanes; and

an analyzer for analyzing evaporation residues;

wherein the vaporizer comprises:

a hotplate,

a cover detachably attached onto the hotplate composing a heating chamber, in contact with an atmosphere external to the analysis apparatus, together with the hotplate, and

one or more of sample vessels, in which their upside are open to store the chlorosilanes in them, arranged in the heating chamber; and

wherein the cover comprises:

a supply port for supplying an inert gas or nitrogen gas into the heating chamber and

a discharge port for discharging gases in the heating chamber.

2. The analysis apparatus of claim 1 , wherein the cover comprises a single supply port and a plurality of discharge ports.

3. The analysis apparatus of claim 1 , wherein the supply port can have a nozzle with a plurality of supply ports.

4. The analysis apparatus of claim 1 , wherein the discharge ports communicate with a box on and abutting the cover of the heating chamber.

5. The analysis apparatus of claim 1 , wherein the discharge ports communicate with a box connected to and abutting the cover of the heating chamber.

6. The analysis apparatus of claim 1 , wherein a height of a lower edge of the supply port is equal to a height of a lower edge of the discharge port.

7. The analysis apparatus of chlorosilanes according to claim 1 , wherein a heating face of the hotplate, an inner face of the cover, and the sample vessel are made of a fluoride type resin.

8. The analysis apparatus of chlorosilanes according to claim 7 , wherein the supply port and the discharge port are located at higher places than positions of upper ends of the sample vessels.

9. The analysis apparatus of chlorosilanes according to claim 1 , wherein the supply port and the discharge port are located at higher places than positions of upper ends of the sample vessels.

10. The analysis apparatus of claim 9 , wherein the supply port and the discharge port are arranged on side walls facing each other.

11. An analysis method of chlorosilanes, using an analysis apparatus in communication with an atmosphere external to the analysis apparatus, comprising:

a vaporization process for vaporizing chlorosilanes and

an analysis process for analyzing an evaporation residue

wherein the vaporization process comprises steps in which the chlorosilanes are stored in sample vessels,

the sample vessels are arranged in a heating chamber in contact with an atmosphere external to the analysis apparatus, and

the heating chamber is heated with an inert gas flowing through the heating chamber.

12. The analysis method of chlorosilanes according to claim 11 , wherein a plurality of reference vessels, in which the chlorosilanes are not stored, are arranged in the heating chamber together with the sample vessels during the vaporization process.

13. The analysis method of claim 11 , wherein the inert gas supplied in the heating chamber through a supply port flows toward a discharge port together with a vapor of vaporized chlorosilanes derived from the sample vessels.

14. The analysis method of claim 11 , wherein nitrogen gas is charged to the heating chamber.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2023
From: MITSUBISHI MATERIALS CORPORATION
To: HIGH-PURITY SILICON CORPORATION
Reel/Frame 063858/0867 →
CHANGE OF ASSIGNEE'S ADDRESS Recorded Feb 13, 2012
From: MITSUBISHI MATERIALS CORPORATION
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 027691/0386 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 11, 2009
From: CHIKUSA, NOBORU; ITOH, MASAKI
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 023120/0594 →
Priority Claims (2)
JP 2008-208211 · Aug 12, 2008 · national
JP 2009-181057 · Aug 3, 2009 · national
Continuity (1)
Related Publication 20100041157A1 · Feb 18, 2010