Polymer inactivation method for polycrystalline silicon manufacturing device
A polymer inactivation method for a polycrystalline silicon manufacturing device, wherein humidified gas such as water vapor and humidified nitrogen gas is supplied into a reacting furnace for manufacturing polycrystalline silicon to hydrolyze polymers adhered to an inner surface of the reacting furnace. It is preferable that a furnace wall of the reacting furnace is heated when the humidified gas is supplied.
1. A polymer inactivation method for a polycrystalline silicon manufacturing device, comprising:
supplying humidified gas into a reacting furnace for manufacturing polycrystalline silicon to hydrolyze polymers adhered to an inner surface of the reacting furnace.
2. The polymer inactivation method for a polycrystalline silicon manufacturing device according to claim 1 ,
wherein a furnace wall of the reacting furnace is heated to a temperature above the dew point of water vapor in the reacting furnace when the humidified gas is supplied.
3. The polymer inactivation method for a polycrystalline silicon manufacturing device according to claim 1 ,
wherein humidified gas is also supplied into an exhaust gas pipe connected to the reacting furnace to hydrolyze polymers adhered to an inner surface of the exhaust gas pipe.
4. The polymer inactivation method for a polycrystalline silicon manufacturing device according to claim 3 ,
wherein the humidified gas is supplied in a state in which a pipe wall of the exhaust gas pipe is heated.
5. The polymer inactivation method for a polycrystalline silicon manufacturing device according to claims 1 ,
wherein humidity of the humidified gas is greater than or equal to 30%.
6. The polymer inactivation method for a polycrystalline silicon manufacturing device according to claims 1 ,
wherein a supply amount of the humidified gas per hour is greater than or equal to 30 times and less than or equal to 60 times with respect to the inner volume of the reacting furnace and the humidified gas is supplied for at least 6 hours.