Apparatus for producing trichlorosilane
An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a storage container that stores the reaction vessel and the heating mechanism; a gas supply internal cylinder that supplies the supply gas in the reaction vessel; a gas discharge external cylinder that is substantially concentrically disposed outside the gas supply internal cylinder, forming a discharge passageway of the reaction product gas between an outer circumferential surface of the gas supply internal cylinder and an inner circumferential surface of the gas discharge external cylinder; and a cooling cylinder that supports the gas discharge external cylinder disposed inside thereof and includes a refrigerant passageway formed therein for circulating a refrigerant.
1. An apparatus for producing trichlorosilane, comprising:
a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride;
a heating mechanism that heats the interior of the reaction vessel;
a storage container that stores the reaction vessel and the heating mechanism;
a gas supply internal cylinder that supplies the supply gas into the reaction vessel;
a gas discharge external cylinder, with a gas discharge pipe at one end, that is substantially concentrically disposed outside the gas supply internal cylinder, forming a discharge passageway of the reaction product gas between an outer circumferential surface of the gas supply internal cylinder and an inner circumferential surface of the gas discharge external cylinder; and
a cooling cylinder, disposed between the gas discharge pipe and the heating mechanism, that supports the gas discharge external cylinder disposed inside thereof and includes a refrigerant passageway formed therein for circulating a refrigerant.
2. The apparatus for producing trichlorosilane according to claim 1 , comprising:
an argon supply mechanism that supplies argon in the storage container.
3. The apparatus for producing trichlorosilane according to claim 1 , wherein
a reaction passageway is formed in the interior of the reaction vessel, in which a plurality of small spaces partitioned by a plurality of reaction tubular walls that have different inner diameters and are substantially concentrically disposed communicate by flow penetration sections formed alternately in lower portions and upper portions of the reaction tubular walls in order from the inside, and
the gas supply internal cylinder and the gas discharge external cylinder are connected to the reaction passageway.
4. The apparatus for producing trichlorosilane according to claim 3 , wherein the gas supply internal cylinder is in communication with the innermost small space of the plurality of small spaces and the discharge passageway is connected to the outermost small space.
5. The apparatus for producing trichlorosilane according to claim 1 , wherein the gas supply internal cylinder and the gas discharge external cylinder are disposed above the reaction vessel, and
the central portion of a bottom plate of the reaction vessel is supported by a support column member, which upwardly protrudes in the storage container from below.
6. The apparatus for producing trichlorosilane according to claim 1 , wherein a member forming the reaction vessel is formed of carbon.
7. The apparatus for producing trichlorosilane according to claim 6 , wherein a surface of the carbon is coated with silicon carbide.
8. The apparatus for producing trichlorosilane according to claim 5 , wherein a member forming the reaction vessel is formed of carbon.
9. The apparatus for producing trichlorosilane according to claim 8 , wherein a surface of the carbon is coated with silicon carbide.
10. The apparatus for producing trichlorosilane according to claim 2 , wherein
a reaction passageway is formed in the interior of the reaction vessel, in which a plurality of small spaces partitioned by a plurality of reaction tubular walls which have different inner diameters and are substantially concentrically disposed communicate by flow penetration sections formed alternately in lower portions and upper portions of the reaction tubular walls in order from the inside, and
the gas supply internal cylinder and the gas discharge external cylinder are connected to the reaction passageway.
11. The apparatus for producing trichlorosilane according to claim 10 , wherein the gas supply internal cylinder is in communication with the innermost small space of the plurality of small spaces and the discharge passageway is connected to the outermost small space.
12. The apparatus for producing trichlorosilane according to claim 10 , wherein the gas supply internal cylinder and the gas discharge external cylinder are disposed above the reaction vessel, and
the central portion of a bottom plate of the reaction vessel is supported by a support column member, which upwardly protrudes in the storage container, from below.
13. The apparatus for producing trichlorosilane according to claim 10 , wherein a member forming the reaction vessel is formed of carbon.
14. The apparatus for producing trichlorosilane according to claim 13 , wherein a surface of the carbon is coated with silicon carbide.
15. The apparatus for producing trichlorosilane according to claim 3 , wherein the gas supply internal cylinder and the gas discharge external cylinder are disposed above the reaction vessel, and
the central portion of a bottom plate of the reaction vessel is supported by a support column member, which upwardly protrudes in the storage container from below.
16. The apparatus for producing trichlorosilane according to claim 3 , wherein a member forming the reaction vessel is formed of carbon.
17. The apparatus for producing trichlorosilane according to claim 11 , wherein the gas supply internal cylinder and the gas discharge external cylinder are disposed above the reaction vessel, and
the central portion of a bottom plate of the reaction vessel is supported by a support column member, which upwardly protrudes in the storage container, from below.
18. The apparatus for producing trichlorosilane according to claim 1 , wherein the gas discharge external cylinder protrudes into the storage container and is fixed to the reaction vessel.
19. An apparatus for producing trichlorosilane, comprising:
a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride;
a heating mechanism that heats the interior of the reaction vessel;
a storage container that stores the reaction vessel and the heating mechanism;
a gas supply internal cylinder that supplies the supply gas into the reaction vessel;
a gas discharge external cylinder that is substantially concentrically disposed outside the gas supply internal cylinder, forming a discharge passageway of the reaction product gas between an outer circumferential surface of the gas supply internal cylinder and an inner circumferential surface of the gas discharge external cylinder; and
a cooling cylinder that supports the gas discharge external cylinder disposed inside thereof and includes a refrigerant passageway formed therein for circulating a refrigerant,
wherein a reaction passageway is formed in the interior of the reaction vessel, in which a plurality of small spaces partitioned by a plurality of reaction tubular walls that have different inner diameters and are substantially concentrically disposed communicate by flow penetration sections formed alternately in lower portions and upper portions of the reaction tubular walls in order from the inside, and
the gas supply internal cylinder and the gas discharge external cylinder are connected to the reaction passageway.
20. An apparatus for producing trichlorosilane, comprising:
a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride;
a heating mechanism that heats the interior of the reaction vessel;
a storage container that stores the reaction vessel and the heating mechanism;
a gas supply internal cylinder that supplies the supply gas into the reaction vessel;
a gas discharge external cylinder that is substantially concentrically disposed outside the gas supply internal cylinder, forming a discharge passageway of the reaction product gas between an outer circumferential surface of the gas supply internal cylinder and an inner circumferential surface of the gas discharge external cylinder; and
a cooling cylinder that supports the gas discharge external cylinder disposed inside thereof and includes a refrigerant passageway formed therein for circulating a refrigerant,
wherein the gas supply internal cylinder and the gas discharge external cylinder are disposed above the reaction vessel, and
the central portion of a bottom plate of the reaction vessel is supported by a support column member, which upwardly protrudes in the storage container from below.