IP Library Granted Patent US 7,964,155
Granted Patent B2
US 7,964,155 · App. 12/226,211 · Granted Jun 21, 2011

Apparatus for producing trichlorosilane

Assignee: Mitsubishi Materials Corporation
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Quick Facts
Patent No.
US 7,964,155
App. No.
12/226,211
Granted
Jun 21, 2011
Kind
B2
Abstract

An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to an internal reaction passageway to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism having a heater that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein the heater is disposed in the center of the reaction vessel, and the reaction passageway is disposed in the periphery of the heater.

Claims (35)

1. An apparatus for producing trichlorosilane, comprising:

a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to an internal reaction passageway, with an open space from a supply hole to a discharge hole and having a plurality of walls, to produce a reaction product gas containing trichlorosilane and hydrogen chloride;

a heating mechanism having a heater that heats the interior of the reaction vessel;

a gas supply section that supplies the supply gas in the reaction vessel; and

a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein

the heater is disposed in the center of the reaction vessel, and

the reaction passageway is disposed in the periphery of the heater.

2. The apparatus for producing trichlorosilane according to claim 1 , wherein the reaction passageway includes:

a supply side passageway which is connected to the gas supply section and flows the supply gas toward the center side from the outer circumference side of the reaction vessel; and

a discharge side passageway that includes an upstream end connected to the supply side passageway and a downstream end connected to the gas discharge section, and flows the reaction product gas produced from the supply gas toward the outer circumference side from the center side of the reaction vessel, and

the supply side passageway and the discharge side passageway are disposed adjoining each other.

3. The apparatus for producing trichlorosilane according to claim 1 , wherein a member forming the reaction vessel is formed of carbon.

4. The apparatus for producing trichlorosilane according to claim 3 , wherein a surface of the carbon is coated with silicon carbide.

5. The apparatus for producing trichlorosilane according to claim 1 , comprising:

a storage container that stores the reaction vessel and the heating mechanism, and

an argon supply mechanism that supplies argon in the storage container.

6. The apparatus for producing trichlorosilane according to claim 3 , comprising:

a storage container for storing the reaction vessel and the heating mechanism, and

an argon supply mechanism for supplying argon in the storage container.

7. The apparatus for producing trichlorosilane according to claim 4 , comprising:

a storage container that stores the reaction vessel and the heating mechanism, and

an argon supply mechanism that supplies argon in the storage container.

8. The apparatus for producing trichlorosilane according to claim 2 , wherein a member forming the reaction vessel is formed of carbon.

9. The apparatus for producing trichlorosilane according to claim 8 , wherein a surface of the carbon is coated with silicon carbide.

10. The apparatus for producing trichlorosilane according to claim 2 , comprising:

a storage container that stores the reaction vessel and the heating mechanism, and

an argon supply mechanism that supplies argon in the storage container.

11. The apparatus for producing trichlorosilane according to claim 8 , comprising:

a storage container for storing the reaction vessel and the heating mechanism, and

an argon supply mechanism for supplying argon in the storage container.

12. The apparatus for producing trichlorosilane according to claim 9 , comprising:

a storage container that stores the reaction vessel and the heating mechanism, and

an argon supply mechanism that supplies argon in the storage container.

13. The apparatus for producing trichlorosilane according to claim 1 , wherein the reaction passageway has a plurality of reaction tubular walls.

14. The apparatus for producing trichlorosilane according to claim 1 , wherein the heating mechanism has an electrode section that flows electric current to the heater.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2023
From: MITSUBISHI MATERIALS CORPORATION
To: HIGH-PURITY SILICON CORPORATION
Reel/Frame 063858/0867 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 10, 2008
From: ISHII, TOSHIYUKI; ITO, HIDEO; SHIMIZU, YUJI
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 021694/0640 →
Priority Claims (2)
JP 2006-297036 · Oct 31, 2006 · national
JP 2007-259447 · Oct 3, 2007 · national
Continuity (1)
Related Publication 20090155140A1 · Jun 18, 2009