IP Library Granted Patent US 8,252,241
Granted Patent B2
US 8,252,241 · App. 12/656,126 · Granted Aug 28, 2012

Apparatus for producing trichlorosilane and method for producing trichlorosilane

Assignee: Mitsubishi Materials Corporation
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Quick Facts
Patent No.
US 8,252,241
App. No.
12/656,126
Granted
Aug 28, 2012
Kind
B2
Abstract

An apparatus for producing trichlorosilane in which metallurgical grade silicon powder supplied to a reactor is reacted with hydrogen chloride gas while being fluidized by the hydrogen chloride gas, thereby discharging trichlorosilane generated by the reaction from the reactor, includes: a plurality of gas flow controlling members which are installed along a vertical direction in an annular shape R from an inner peripheral wall of the reactor in an internal space of the reactor; and a heat transfer tube which is installed along the vertical direction in the annular space R and through which a heating medium passes.

Claims (26)

1. An apparatus for producing trichlorosilane comprising:

a reactor;

a raw material supply device that supplies metallurgical grade silicon powder as raw material to the reactor;

a gas introduction device that introduces hydrogen chloride gas to the reactor so that the hydrogen chloride gas reacts with the metallurgical grade silicon powder while the metallurgical grade silicon powder is fluidized by the hydrogen chloride gas;

a gas discharge device that discharges generated gas containing trichlorosilane from the reactor;

a plurality of gas flow controlling members each having on an upper portion an upper diameter-enlarged portion and each having on a lower portion a lower diameter-enlarged portion and each of the plurality of gas flow controlling members being suspended in a central space of the reactor along the vertical direction;

a first member connected to the reactor for suspending the plurality of gas flow controlling members at the upper diameter-enlarged portion;

a second member connected to the reactor for detachably disposing thereon the lower diameter-enlarged portion of the plurality of gas flow controlling members; and

a heat transfer tube which is installed vertically in an annular space enclosing the central space of the reactor and through which a heating medium passes.

2. The apparatus according to claim 1 , further comprising:

a cylindrical member which constitutes a part of a wall of an upper part of the reactor and is detachably provided on a body of the reactor; and

the first member for suspending the plurality of gas flow controlling members being a holed guide member which has a plurality of through-holes and is provided inside the body,

wherein an upper end portion of the heat transfer tube is supported by the cylindrical member and the gas flow controlling members are positioned in and through the holed guide member.

3. The apparatus according to claim 2 ,

wherein a large diameter portion greater in diameter than the body of the reactor is connected to the body, and

the cylindrical member constitutes at least a part of a wall of the large diameter portion.

4. The apparatus according to claim 1 , wherein the heating medium accelerates the reaction between the metallurgical grade silicon powder and the hydrogen chloride gas.

5. The apparatus according to claim 4 , wherein the heating medium is dibenzyltoluene.

6. The apparatus according to claim 4 , wherein the heating medium is at a temperature range of −30° C. to 350° C.

7. The apparatus according to claim 1 , further comprising a thermometer located at a lower part of the reactor.

8. The apparatus according to claim 1 , wherein unreacted metallurgical grade silicon powder ascending by an upward flow falls down into the annular space.

9. The apparatus according to claim 2 , further comprising:

a pressing frame which is detachable from the reactor, wherein,

each of through holes is provided in a plurality of guide tubes respectively,

the upper diameter-enlarged portion is supported on a top end of the guide tube so as to suspend the gas flow controlling members on the holed guide member,

the pressing frame prevents the gas flow controlling members from being lifted up by an upward flows of a gas.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2023
From: MITSUBISHI MATERIALS CORPORATION
To: HIGH-PURITY SILICON CORPORATION
Reel/Frame 063858/0867 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 19, 2010
From: NARUKAWA, MITSUTOSHI
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 023868/0521 →
Priority Claims (1)
JP P2009-010358 · Jan 20, 2009 · national
Continuity (1)
Related Publication 20100183496A1 · Jul 22, 2010