IP Library › Assignment 025676/0263
Patent Assignment
Reel/Frame 025676/0263

Assignment of Assignor's Interest

Recorded: 2011-01-21 Pages: 2
Assignors
YAMADA, KENTARO
Executed: 2010-12-03
SHIMADA, TAKESHI
Executed: 2010-12-03
ABE, TAKAHIRO
Executed: 2010-12-03
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU,, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Method
Patent: 9,070,388 →
Application: 13/011,019 →
Publication: US 2012/0103933
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →