IP Library › Assignment 025932/0696
Patent Assignment
Reel/Frame 025932/0696

Assignment of Assignor's Interest

Recorded: 2011-03-10 Pages: 4
Assignors
SENDA, SHINICHIRO
Executed: 2011-02-28
YAMAKOSHI, YASUHIRO
Executed: 2011-02-28
ITO, JUNICHI
Executed: 2011-02-28
Assignee
JX NIPPON MINING & METALS CORPORATION
6-3, OTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, 100-8164, JAPAN
Covered Property (1)
Barrier Film for Semiconductor Wiring, Sintered Compact Sputtering Target and Method of Producing the Sputtering Target
Patent: 9,051,645 →
Application: 13/059,582 →
Publication: US 2011/0155570
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Address Feb 7, 2017
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 041649/0733 →
Change of Address Aug 11, 2021
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 057160/0114 →