IP Library › Assignment 026695/0646
Patent Assignment
Reel/Frame 026695/0646

Assignment of Assignor's Interest

Recorded: 2011-07-27 Pages: 3
Assignor
OGAWA, TAKASHI
Executed: 2011-07-18
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property (1)
Charged Particle Beam Apparatus and Sample Processing Method
Patent: 8,269,188 →
Application: 13/135,300 →
Publication: US 2012/0001086
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →
Change of Name Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0636 →
Change of Address Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072909/0223 →