IP Library Assignment 026844/0018
Patent Assignment
Reel/Frame 026844/0018

Assignment of Assignor's Interest

Recorded: 2011-09-01 Pages: 6
Assignors
TAHARA, SHIGERU
Executed: 2011-07-11
NISHIMURA, EIICHI
Executed: 2011-07-12
YAMASHITA, FUMIKO
Executed: 2011-07-08
TOMITA, HIROSHI
Executed: 2011-07-12
OHIWA, TOKUHISA
Executed: 2011-07-11
OKUCHI, HISASHI
Executed: 2011-07-11
OMURA, MITSUHIRO
Executed: 2011-07-11
Assignees
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, 105-8001, JAPAN
Covered Property (1)
Plasma Processing Method and Manufacturing Method of Semiconductor Device
Patent: 9,177,781 →
Application: 13/178,759 →
Publication: US 2012/0009786
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 28, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043727/0167 →
Merger Jan 20, 2022
From: TOSHIBA MEMORY CORPORATION
To: K.K.PANGEA
Reel/Frame 058788/0338 →
Assignment of Assignor's Interest Feb 1, 2022
From: K.K.PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 058922/0308 →
Change of Name Feb 11, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 059039/0123 →