IP Library Assignment 059039/0123
Patent Assignment
Reel/Frame 059039/0123

Change of Name

Recorded: 2022-02-11 Pages: 98
Assignor
TOSHIBA MEMORY CORPORATION
Executed: 2019-10-01
Assignee
KIOXIA CORPORATION
1-21, SHIBAURA 3-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties (19)
Vacuum Processing Apparatus and Substrate Transfer Method
Patent: 6,990,747 →
Application: 10/821,971 →
Publication: US 2004/0255485
Plasma Processing Apparatus
Patent: 7,368,876 →
Application: 10/854,142 →
Publication: US 2005/0011452
Chemical Mechanical Polishing Aqueous Dispersion and Chemical Mechanical Polishing Method
Patent: 6,935,928 →
Application: 10/882,362 →
Publication: US 2005/0037693
Method of Selecting Photomask Blank Substrates
Patent: 7,329,475 →
Application: 10/896,968 →
Publication: US 2005/0019676
Photomask Blank Substrate, Photomask Blank and Photomask
Patent: 7,351,504 →
Application: 10/896,970 →
Publication: US 2005/0019677
Etching Method
Patent: 7,285,498 →
Application: 10/956,365 →
Publication: US 2005/0085077
Peeling Device and Peeling Method
Patent: 7,172,673 →
Application: 11/038,479 →
Publication: US 2005/0205204
Vacuum Processing Apparatus and Substrate Transfer Method
Patent: 7,201,851 →
Application: 11/259,147 →
Publication: US 2006/0032074
Substrate Plasma Processing Apparatus and Plasma Processing Method
Patent: 8,821,684 →
Application: 12/363,070 →
Publication: US 2009/0194508
Chemical Mechanical Polishing Method and Method of Manufacturing Semiconductor Device
Patent: 8,119,517 →
Application: 12/477,332 →
Publication: US 2009/0239373
Chemical Mechanical Polishing Aqueous Dispersion and Chemical Mechanical Polishing Method
Patent: 8,492,276 →
Application: 12/537,766 →
Publication: US 2010/0075501
Plasma Etching Unit
Patent: 8,840,753 →
Application: 12/578,007 →
Publication: US 2010/0024983
Surface Treatment Composition, Surface Treatment Method, and Method for Manufacturing Semiconductor Device
Patent: 8,257,504 →
Application: 12/794,028 →
Publication: US 2010/0311630
Plasma Processing Method and Manufacturing Method of Semiconductor Device
Patent: 9,177,781 →
Application: 13/178,759 →
Publication: US 2012/0009786
Supercritical Drying Method and Apparatus for Semiconductor Substrates
Patent: 8,372,212 →
Application: 13/369,970 →
Publication: US 2012/0247516
Supercritical Drying Method for Semiconductor Substrate and Supercritical Drying Apparatus
Patent: 8,771,429 →
Application: 13/420,870 →
Publication: US 2013/0019905
Substrate Processing Method, Substrate Processing Apparatus, and Storage Medium
Application: 13/482,318 →
Publication: US 2012/0304485
Substrate Processing Method and Storage Medium
Application: 13/941,836 →
Publication: US 2014/0020721
Deposit Removal Method
Patent: 9,177,816 →
Application: 14/222,762 →
Publication: US 2014/0206198
Related Assignments (23)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Jul 23, 2004
From: NAKATSU, MASAYUKI; NUMANAMI, TSUNEO; MOGI, MASAYUKI; ITOH, MASAMITSU
To: SHIN-ETSU CHEMICAL CO., LTD.; NIKON CORPORATION; KABUSHIKI KAISHA TOSHIBA
Reel/Frame 015620/0049 →
Assignment of Assignor's Interest Jul 23, 2004
From: NAKATSU, MASAYUKI; NUMANAMI, TSUNEO; MOGI, MASAYUKI; ITOH, MASAMITSU
To: SHIN-ETSU CHEMICAL CO., LTD.; KABUSHIKI KAISHA TOSHIBA; NIKON CORPORATION
Reel/Frame 015615/0711 →
Assignment of Assignor's Interest Aug 23, 2004
From: KITOKU, TOSHIHIKO; NIWA, SHINJI; HOSAKA, TOSHIKI; KITAZAWA, TAKASHI
To: TOKYO ELECTRON LIMITED; KABUSHIKI KAISHA TOSHIBA
Reel/Frame 015736/0888 →
Assignment of Assignor's Interest Sep 27, 2004
From: HAYAMI, TOSHIHIRO; ITO, ETSUJI; SAKAI, ITSUKO
To: TOKYO ELECTRON LIMITED
Reel/Frame 015835/0289 →
Assignment of Assignor's Interest Oct 29, 2004
From: UCHIKURA, KAZUHITO; NISHIMOTO, KAZUO; HATTORI, MASAYUKI; KAWAHASHI, NOBUO
To: JSR CORPORATION; KABUSHIKI KAISHA TOSHIBA
Reel/Frame 015938/0431 →
Assignment of Assignor's Interest Dec 17, 2004
From: OGAWA, KAZUTO; INAZAWA, KOICHIRO (DECEASED); HAYASHI, HISATAKA; OHIWA, TOKUHISA
To: TOKYO ELECTRON LIMITED; KABUSHIKI KAISHA TOSHIBA
Reel/Frame 016086/0896 →
Assignment of Assignor's Interest Jun 7, 2005
From: KUROSAWA, TETSUYA; OTSUKA, MASAHISA
To: KABUSHIKI KAISHA TOSHIBA; LINTEC CORPORATION
Reel/Frame 016307/0527 →
Substitute Assignment Dec 4, 2006
From: HAYAMI, TOSHIHIRO; ITO, ETSUJI; SAKAI, ITSUKO
To: TOKYO ELECTRON LIMITED; KABUSHIKI KAISHA TOSHIBA
Reel/Frame 018589/0356 →
Assignment of Assignor's Interest Apr 7, 2009
From: UI, AKIO; TAMAOKI, NAOKI; ICHIKAWA, TAKASHI; HAYASHI, HISATAKA
To: KABUSHIKI KAISHA TOSHIBA; TOKYO ELECTRON LIMITED
Reel/Frame 022515/0034 →
Assignment of Assignor's Interest Oct 8, 2009
From: ABE, TAICHI; SHIDA, HIROTAKA; TAKEMURA, AKIHIRO; MENO, MITSURU
To: JSR CORPORATION; KABUSHIKI KAISHA TOSHIBA
Reel/Frame 023344/0730 →
Assignment of Assignor's Interest Jun 4, 2010
From: MORI, YASUMASA; SHIDA, HIROTAKA; KAWAGUCHI, KAZUO; YANO, HIROYUKI
To: JSR CORPORATION; KABUSHIKI KAISHA TOSHIBA
Reel/Frame 024488/0586 →
Assignment of Assignor's Interest Sep 1, 2011
From: TAHARA, SHIGERU; NISHIMURA, EIICHI; YAMASHITA, FUMIKO; TOMITA, HIROSHI
To: TOKYO ELECTRON LIMITED; KABUSHIKI KAISHA TOSHIBA
Reel/Frame 026844/0018 →
Assignment of Assignor's Interest Feb 10, 2012
From: SATO, YOHEI; OKUCHI, HISASHI; TOMITA, HIROSHI; HAYASHI, HIDEKAZU
To: KABUSHIKI KAISHA TOSHIBA; TOKYO ELECTRON LIMITED
Reel/Frame 027686/0145 →
Assignment of Assignor's Interest Mar 15, 2012
From: JI, LINAN; HAYASHI, HIDEKAZU; TOMITA, HIROSHI; OKUCHI, HISASHI
To: KABUSHIKI KAISHA TOSHIBA; TOKYO ELECTRON LIMITED
Reel/Frame 027868/0046 →
Assignment of Assignor's Interest Aug 10, 2012
From: HAYASHI, HIDEKAZU; SATO, YOHEI; OKUCHI, HISASHI; TOMITA, HIROSHI
To: KABUSHIKI KAISHA TOSHIBA; TOKYO ELECTRON LIMITED
Reel/Frame 028765/0808 →
Assignment of Assignor's Interest Aug 29, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043435/0684 →
Assignment of Assignor's Interest Sep 28, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043727/0167 →
Assignment of Assignor's Interest Sep 28, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043728/0156 →
Assignment of Assignor's Interest Sep 28, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043728/0191 →
Merger Jan 20, 2022
From: TOSHIBA MEMORY CORPORATION
To: K.K.PANGEA
Reel/Frame 058788/0338 →
Assignment of Assignor's Interest Feb 1, 2022
From: K.K.PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 058922/0308 →
Merger Sep 22, 2025
From: JSR CORPORATION
To: JICC-02 CORPORATION
Reel/Frame 072935/0152 →
Change of Name Sep 22, 2025
From: JICC-02 CORPORATION
To: JSR CORPORATION
Reel/Frame 072326/0282 →