IP Library Assignment 043728/0191
Patent Assignment
Reel/Frame 043728/0191

Assignment of Assignor's Interest

Recorded: 2017-09-28 Pages: 4
Assignor
KABUSHIKI KAISHA TOSHIBA
Executed: 2017-09-05
Assignee
TOSHIBA MEMORY CORPORATION
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Method of Selecting Photomask Blank Substrates
Patent: 7,329,475 →
Application: 10/896,968 →
Publication: US 2005/0019676
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jul 23, 2004
From: NAKATSU, MASAYUKI; NUMANAMI, TSUNEO; MOGI, MASAYUKI; ITOH, MASAMITSU
To: SHIN-ETSU CHEMICAL CO., LTD.; KABUSHIKI KAISHA TOSHIBA; NIKON CORPORATION
Reel/Frame 015615/0711 →
Merger Jan 20, 2022
From: TOSHIBA MEMORY CORPORATION
To: K.K.PANGEA
Reel/Frame 058788/0338 →
Assignment of Assignor's Interest Feb 1, 2022
From: K.K.PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 058922/0308 →
Change of Name Feb 11, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 059039/0123 →