IP Library Assignment 015615/0711
Patent Assignment
Reel/Frame 015615/0711

Assignment of Assignor's Interest

Recorded: 2004-07-23 Pages: 8
Assignors
NAKATSU, MASAYUKI
Executed: 2004-07-15
NUMANAMI, TSUNEO
Executed: 2004-07-15
MOGI, MASAYUKI
Executed: 2004-07-15
ITOH, MASAMITSU
Executed: 2004-07-20
HAGIWARA, TSUNEYUKI
Executed: 2004-07-15
KONDO, NAOTO
Executed: 2004-07-15
Assignees
SHIN-ETSU CHEMICAL CO., LTD.
6-1 OTEMAHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
KABUSHIKI KAISHA TOSHIBA
1-1 SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
NIKON CORPORATION
2-3, MARUNOUCHI 3-CHOME, CHIYODA-KU, TOKYO 100-8331, JAPAN
Covered Property (1)
Method of Selecting Photomask Blank Substrates
Patent: 7,329,475 →
Application: 10/896,968 →
Publication: US 2005/0019676
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 28, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043728/0191 →
Merger Jan 20, 2022
From: TOSHIBA MEMORY CORPORATION
To: K.K.PANGEA
Reel/Frame 058788/0338 →
Assignment of Assignor's Interest Feb 1, 2022
From: K.K.PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 058922/0308 →
Change of Name Feb 11, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 059039/0123 →