Patent Assignment
Reel/Frame 026888/0919
Assignment of Assignor's Interest
Recorded: 2011-09-12
Pages: 4
Assignors
YOSHIKAWA, HIROKI
Executed: 2011-08-17
INAZUKI, YUKIO
Executed: 2011-08-17
KOITABASHI, RYUJI
Executed: 2011-08-17
KANEKO, HIDEO
Executed: 2011-08-17
HARAGUCHI, TAKASHI
Executed: 2011-08-17
KOJIMA, YOSUKE
Executed: 2011-08-17
HIROSE, TOMOHITO
Executed: 2011-08-17
Assignees
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OHTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, 100-0004, JAPAN
TOPPAN PRINTING CO., LTD.
5-1, TAITO 1-CHOME, TAITO-KU, TOKYO, 110-0016, JAPAN
Covered Property
(1)
Photomask Blank and Making Method, Photomask, Light Pattern Exposure Method, and Design Method of Transition Metal/Silicon Base Material Film
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.