Patent Assignment
Reel/Frame 026920/0057
Assignment of Assignor's Interest
Recorded: 2011-09-16
Pages: 6
Assignors
PECKERAR, MARTIN C.
Executed: 2007-04-27
DAGENAIS, MARIO
Executed: 2007-05-02
BARRY, JOHN D.
Executed: 2007-05-07
NGU, YVES
Executed: 2007-05-20
Assignee
UNIVERSITY OF MARYLAND, COLLEGE PARK
0133 COLE STUDENT ACTIVITIES BLDG., COLLEGE PARK, MARYLAND, 20742
Covered Properties
(3)
Photolithographic Mask Exhibiting Enhanced Light Transmission Due to Utilizing Sub-Wavelength Aperture Arrays for Imaging Patterns in Nano-Lithography
Stepper System for Ultra-High Resolution Photolithography Using Photolithographic Mask Exhibiting Enhanced Light Transmission Due to Utilizing Sub-Wavelength Aperture Arrays
Subwavelength apertures nanolithography masking
Application:
60/924,179 →
Related Assignments
(1)
Other recorded transfers of the patents in this record — the chain of ownership.