Confirmatory License

Recorded: 2018-08-09 Pages: 3

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Assignor

UNIVERSITY OF MARYLAND

Executed: 2008-11-05

Assignee

DEPARTMENT OF THE NAVY

47076 LILJENCRANTZ ROAD, BLDG. 435, PATUXENT RIVER, MARYLAND, 20670

Covered Properties (2)

Photolithographic Mask Exhibiting Enhanced Light Transmission Due to Utilizing Sub-Wavelength Aperture Arrays for Imaging Patterns in Nano-Lithography

Patent: 8,052,908 →

Application: 12/114,373 →

Publication: US 2009/0068570

Stepper System for Ultra-High Resolution Photolithography Using Photolithographic Mask Exhibiting Enhanced Light Transmission Due to Utilizing Sub-Wavelength Aperture Arrays

Patent: 8,054,450 →

Application: 12/114,409 →

Publication: US 2009/0201475

Related Assignments (1)

Other recorded transfers of the patents in this record — the chain of ownership.

Assignment of Assignor's Interest Sep 16, 2011

From: PECKERAR, MARTIN C.; DAGENAIS, MARIO; BARRY, JOHN D.; NGU, YVES

To: UNIVERSITY OF MARYLAND, COLLEGE PARK

Reel/Frame 026920/0057 →