IP Library Assignment 027010/0184
Patent Assignment
Reel/Frame 027010/0184

Assignment of Assignor's Interest

Recorded: 2011-10-04 Pages: 2
Assignors
ICHIMARU, TOMOYOSHI
Executed: 2011-08-10
KUWABARA, KENICHI
Executed: 2011-08-01
SAITO, GO
Executed: 2011-08-01
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Method
Patent: 8,580,689 →
Application: 13/210,446 →
Publication: US 2013/0015158
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →